Inventors:
Michael J. Grieco - Gillette NJ
Laura P. Hale - Durham NC
Assignee:
AT&T Bell Laboratories - Murray Hill NJ
International Classification:
G03C 500, B44C 122, C03C 1500, B05D 306
Abstract:
In order to hard-bake the bottom resist layer of a tri-level resist system for patterning a device wafer, the resist is subjected to a positive ramp heating step (of increasing ambient temperatures).