KEVIN J CHEETHAM
Broker in Millbury, MA
License number
Massachusetts 9010474
Issued Date
Dec 10, 1994
Expiration Date
Jun 26, 2003
Type
Salesperson
Address
Address
Millbury, MA 01527
Professional information
Photoimageable Resist Compositions Containing Photobase Generator
US Patent:
5627010, May 6, 1997
Filed:
Apr 15, 1994
Appl. No.:
8/228187
Inventors:
Daniel Y. Pai - Millbury MA
Stephen S. Rodriguez - Monument Beach MA
Kevin J. Cheetham - Millbury MA
Gary S. Calabrese - North Andover MA
Roger F. Sinta - Woburn MA
Stephen S. Rodriguez - Monument Beach MA
Kevin J. Cheetham - Millbury MA
Gary S. Calabrese - North Andover MA
Roger F. Sinta - Woburn MA
Assignee:
Shipley Company, L.L.C. - Marlborough MA
International Classification:
G03C 173, G03F 7031, G03F 7032
US Classification:
4302701
Abstract:
A radiation sensitive composition, process for using said composition, and substrates coated with said composition. The photoimageable composition comprises a photobase generator compound, a resin binder and a material capable of crosslinking in the presence of base. In preferred aspects, the invention provides a negative-acting, aqueous developable photoimageable composition comprising a photobase generator compound, a resin binder which preferably is a phenolic polymer, a crosslinking agent that comprises one or more active groups that will undergo base-initiated crosslinking, and a curing agent.
Light-Sensitive Composition And Process
US Patent:
5312715, May 17, 1994
Filed:
Feb 3, 1992
Appl. No.:
7/829371
Inventors:
George R. E. Daniels - Mattapan MA
Michael J. Oddi - Springhill FL
Kevin J. Cheetham - Millbury MA
Stephen S. Rodriguez - Monument Beach MA
Michael J. Oddi - Springhill FL
Kevin J. Cheetham - Millbury MA
Stephen S. Rodriguez - Monument Beach MA
Assignee:
Shipley Company Inc. - Marlborough MA
International Classification:
G03C 1725
US Classification:
430280
Abstract:
A photoimageable composition and process for use of the same. The composition comprises a binder that is a mixture of a phenolic resin and a multifunctional epoxy or vinyl ether pound and a curing system comprising a photoactive compound capable of generating a curing catalyst capable of crosslinking the binder components. The process for use of the composition comprises application of the composition to a substrate, drying of the same, exposing the dried coating to activating radiation, curing the binder in light exposed areas, developing the coating and thermally curing the developed image. The composition is especially useful as a solder mask.
Light-Sensitive Composition And Process
US Patent:
5397685, Mar 14, 1995
Filed:
Nov 26, 1993
Appl. No.:
8/157312
Inventors:
George R. E. Daniels - Mattapan MA
Michael J. Oddi - Springhill FL
Kevin J. Cheetham - Millbury MA
Stephen S. Rodriguez - Monument Beach MA
Michael J. Oddi - Springhill FL
Kevin J. Cheetham - Millbury MA
Stephen S. Rodriguez - Monument Beach MA
Assignee:
Shipley Company Inc. - Marlborough MA
International Classification:
G03C 500
US Classification:
430325
Abstract:
A photoimageable composition and process for use of the same. The composition comprises a binder that is a mixture of a phenolic resin and a multifunctional epoxy or vinyl compound and a curing system comprising a photoactive compound capable of generating a curing catalyst capable of crosslinking the binder components. The process for use of the composition comprises application of the composition to a substrate, drying of the same, exposing the dried coating to activating radiation, curing the binder in light exposed areas, developing the coating and thermally curing the developed image. The composition is especially useful as a solder mask.