KEITH PAUL STANDIFORD
Pilots at Carmel Riviera Dr, Carmel, CA
License number
California A4210326
Issued Date
Jun 2016
Expiration Date
Jun 2018
Category
Airmen
Type
Authorized Aircraft Instructor
Address
Address
160 Carmel Riviera Dr, Carmel, CA 93923
Professional information
Non-Shot-Noise-Limited Source For Electron Beam Lithography Or Inspection
US Patent:
8063365, Nov 22, 2011
Filed:
Dec 2, 2008
Appl. No.:
12/326518
Inventors:
Keith Standiford - Carmel CA, US
Alan Brodie - Palo Alto CA, US
Alan Brodie - Palo Alto CA, US
Assignee:
KLA-Tencor Corporation - Milpitas CA
International Classification:
G01N 23/00
US Classification:
250310, 250306, 250307, 250311
Abstract:
One embodiment relates to an electron source apparatus for an electron beam lithography tool or an electron beam inspection tool. A cathode is configured to emit electrons, and an anode is configured to accelerate the electrons so as to create an electron beam. There are no beam apertures in the electron source apparatus that are positioned at non-focal planes. An electron lens may be configured to focus the electron beam to form a cathode image at a focal plane, and a beam aperture may positioned at the focal plane. Other embodiments, aspects and features are also disclosed.
Ion Beam Extractor With Counterbore
US Patent:
2003016, Sep 11, 2003
Filed:
Feb 13, 2003
Appl. No.:
10/367664
Inventors:
Qing Ji - Berkeley CA, US
Keith Standiford - Carmel CA, US
Ka-Ngo Leung - Hercules CA, US
Keith Standiford - Carmel CA, US
Ka-Ngo Leung - Hercules CA, US
International Classification:
G21K001/08, H01J003/14
US Classification:
250/39600R
Abstract:
An extractor system for a plasma ion source has a single (first) electrode with one or more apertures, or a pair of spaced electrodes, a first or plasma forming electrode and a second or extraction electrode, with one or more aligned apertures. The aperture(s) in the first electrode (or the second electrode or both) have a counterbore on the downstream side (i.e. away from the plasma ion source or facing the second electrode). The counterbored extraction system reduces aberrations and improves focusing. The invention also includes an ion source with the counterbored extraction system, and a method of improving focusing in an extraction system by providing a counterbore.
Region-Of-Interest Based Electron Beam Metrology
US Patent:
7241991, Jul 10, 2007
Filed:
Nov 9, 2005
Appl. No.:
11/271122
Inventors:
Keith Standiford - Carmel CA, US
Mark A. Neil - San Jose CA, US
Mark A. Neil - San Jose CA, US
Assignee:
KLA-Tencor Technologies Corporation - Milpitas CA
International Classification:
H01L 21/00, H01J 37/26
US Classification:
250306, 250307, 250310, 2504922, 2504923
Abstract:
One embodiment relates to a method for metrology using an electron beam apparatus. At least one region of interest is selected in a field of view at a magnification level. Scanning parameters are determined to selectively scan over the at least one regions of interest under the magnification level of the field of view. The electron beam is selectively scanned over the at least one region of interest to capture image data from the at least one region of interest while maintaining the magnification level of the field of view. Other embodiments are also disclosed.