JUNG KIM
Nursing at Country Dr, Fremont, CA
License number
California 431516
Category
Nursing
Type
Registered Nurse
Address
Address
2296 Country Dr, Fremont, CA 94536
Phone
(510) 795-3733
Personal information
See more information about JUNG KIM at radaris.comName
Address
Phone
4506 Gilbert Pl, Los Angeles, CA 90004
4484 Emerald St #35, Torrance, CA 90503
4457 Rosewood Ave, Los Angeles, CA 90004
445 S Nw Hampshire Ave Apt 317, Los Angeles, CA 90020
447 W Duarte Rd UNIT 4, Arcadia, CA 91007
Professional information
Jung Kim, Fremont CA
Specialties:
Nursing (Registered Nurse)
Address:
2296 Country Dr, Fremont 94536
(510) 795-3733 (Phone)
(510) 795-3733 (Phone)
Languages:
English
Rf-Biased Capacitively-Coupled Electrostatic (Rfb-Cce) Probe Arrangement For Characterizing A Film In A Plasma Processing Chamber
US Patent:
8164353, Apr 24, 2012
Filed:
Jul 7, 2009
Appl. No.:
12/498955
Inventors:
Jean-Paul Booth - Essonne, FR
Luc Albarede - Fremont CA, US
Jung Kim - Fremont CA, US
Douglas Keil - Fremont CA, US
Luc Albarede - Fremont CA, US
Jung Kim - Fremont CA, US
Douglas Keil - Fremont CA, US
Assignee:
Lam Research Corporation - Fremont CA
International Classification:
G01R 27/26, G01R 31/08
US Classification:
324686, 324522
Abstract:
A method for characterizing deposited film on a substrate within a processing chamber during processing is provided. The method includes determining voltage-current characteristic for a probe head when measuring capacitor is set at a first capacitance value. The method also includes applying RF train to the probe head when measuring capacitor is set at a capacitance value greater than first capacitance value. The method further includes providing an initial resistance value and an initial capacitance value for the deposited film. The method yet also includes employing initial resistance value, initial capacitance value, and voltage-current characteristic to generate simulated voltage-time curve. The method yet further includes determining measured voltage-time curve, which represents potential drop across the deposited film for one RF train. The method more over includes comparing the two curves.