JOSEPH P PERRY
Architects in Atlanta, GA
License number
Pennsylvania RA013422B
Category
Architects
Type
Registered Architect
Address
Address
2
Atlanta, GA 30324
Pennsylvania
Pennsylvania
Personal information
See more information about JOSEPH P PERRY at radaris.comName
Address
Phone
508 Pleasant Hill Church Rd NE, Winder, GA 30680
515 S Market St, Martinsburg, PA 16662
513 N Broad St, Lenox, GA 31637
517 Jessup St, Scranton, PA 18512
5180 Ashbaugh Rd, Murrysville, PA 15668
Professional information
Deparment Manager At Nordstrom
Position:
Deparment Manager at Nordstrom
Location:
Greater Atlanta Area
Industry:
Apparel & Fashion
Work:
Nordstrom
since Nov 2010
-
Deparment Manager
Education:
Morehouse College 2002 - 2006
Bachelor of Business Administration (B.B.A.), Business, Management, Marketing, and Related Support Services Morehouse College 2002 - 2006
Bachelor's degree, Business Administration and Management, General
Bachelor of Business Administration (B.B.A.), Business, Management, Marketing, and Related Support Services Morehouse College 2002 - 2006
Bachelor's degree, Business Administration and Management, General
Toppstep Regional Consultant At Ga Dept Of Labor
Position:
TOPPSTEP REGIONAL CONSULTANT at GA DEPT OF LABOR
Location:
Greater Atlanta Area
Industry:
Government Administration
Work:
GA DEPT OF LABOR
-
TOPPSTEP REGIONAL CONSULTANT
Coated Metal Oxide Nanoparticles And Methods For Producing Same
US Patent:
2010002, Feb 4, 2010
Filed:
May 12, 2006
Appl. No.:
11/914205
Inventors:
Joseph Perry - Atlanta GA, US
Simon Jones - Santa Monica CA, US
Joshua N. Haddock - Roanoke VA, US
Peter Hotchkiss - Atlanta GA, US
Simon Jones - Santa Monica CA, US
Joshua N. Haddock - Roanoke VA, US
Peter Hotchkiss - Atlanta GA, US
International Classification:
H01G 4/08, B32B 5/16, C07F 9/02, C07D 303/00, C07D 305/02, C07D 207/24, B05D 3/10, C08K 3/22
US Classification:
361323, 428403, 558207, 558190, 549512, 549510, 548544, 427309, 523200, 977773
Abstract:
Disclosed are coated metal oxide nanoparticles comprising a metal oxide nanoparticle having a surface; and ligands attached to the metal oxide nanoparticle surface. Also disclosed are phosphonic acid compounds comprising the structure Gn-R-Xn, wherein G is a terminal group; wherein R is a bridging group; wherein X is a phosphonic acid group; and wherein each n is, independently, 1, 2, or 3. Also disclosed are methods for preparing and using coated metal oxide nanoparticles. Also disclosed are nanocomposite compositions comprising a polymer; and a coated metal oxide nanoparticle dispersed within the polymer. Also disclosed are articles, films, and capacitors comprising a coated metal oxide nanoparticle or a nanocomposite composition. This abstract is intended as a scanning tool for purposes of searching in the particular art and is not intended to be limiting of the present invention.
Materials, Methods, And Uses For Photochemical Generation Of Acids And/Or Radical Species
US Patent:
7459106, Dec 2, 2008
Filed:
Apr 1, 2002
Appl. No.:
10/473365
Inventors:
Seth Marder - Atlanta GA, US
Joseph Perry - Atlanta GA, US
Wenhui Zhou - Tucson AZ, US
Stephen M. Kuebler - Oviedo FL, US
J. Kevin Cammack - Oceanside CA, US
Joseph Perry - Atlanta GA, US
Wenhui Zhou - Tucson AZ, US
Stephen M. Kuebler - Oviedo FL, US
J. Kevin Cammack - Oceanside CA, US
Assignee:
The Arizona Board of Regents on Behalf of the University of Arizona - Tucson AZ
International Classification:
G03C 1/73, C09K 9/02, G03G 5/00
US Classification:
252600, 252582, 252583, 2525011, 568 77
Abstract:
The present invention provides compounds and compositions, which include: at least one chromophore having strong simultaneous two-photon or multi-photon absorptivity; at least one acid- or radical-generator in close proximity to the chromophore; such that the single- or multi-photon excitation of the chromophore results in the generation of an acid and/or redical that is capable of activating chemistry; and such that compositions of matter based on the componds and compositions of the invention can be photo-patterned by one- or multiphoton excitation.
Printable Thin-Film Transistors With High Dielectric Constant Gate Insulators And Methods For Producing Same
US Patent:
8405069, Mar 26, 2013
Filed:
Nov 13, 2007
Appl. No.:
12/514358
Inventors:
Bernard Kippelen - Decatur GA, US
Joseph Perry - Atlanta GA, US
Seth Marder - Atlanta GA, US
Simon Jones - Los Angeles CA, US
Joshua N. Haddock - Roanoke VA, US
Xiaohong Zhang - Atlanta GA, US
Benoit Domercq - Atlanta GA, US
Peter Hotchkiss - Atlanta GA, US
Joseph Perry - Atlanta GA, US
Seth Marder - Atlanta GA, US
Simon Jones - Los Angeles CA, US
Joshua N. Haddock - Roanoke VA, US
Xiaohong Zhang - Atlanta GA, US
Benoit Domercq - Atlanta GA, US
Peter Hotchkiss - Atlanta GA, US
Assignee:
Georgia Tech Research Corporation - Atlanta GA
International Classification:
H01L 35/24
US Classification:
257 40, 257E51001
Abstract:
Disclosed are embodiments of organic thin-film transistors (OTFT) with a gate insulator layer comprised of nanocomposites incorporating metal oxide nanoparticles coated by organic ligands and methods of fabricating such OTFTs. This abstract is intended as a scanning tool for purposes of searching in the particular art and is not intended to be limiting of the present invention.
Deprotection Of Functional Groups By Multi-Photon Induced Electron Transfer
US Patent:
2010020, Aug 19, 2010
Filed:
Jul 12, 2007
Appl. No.:
12/373318
Inventors:
Seth Marder - Atlanta GA, US
Stephen Barlow - Atlanta GA, US
Joseph Perry - Sandy Springs GA, US
Jing Wang - Tucson AZ, US
Stephen Barlow - Atlanta GA, US
Joseph Perry - Sandy Springs GA, US
Jing Wang - Tucson AZ, US
International Classification:
G02B 5/23, C07C 69/76, C07C 69/612
US Classification:
252586, 560 54, 560 51, 560251, 20415769, 2041576
Abstract:
The present invention provides novel compositions suitable for use in an intermolecular photodeprotection reaction scheme. Such compositions include a chromophore compound and a second compound having a photocleavable group bonded to a protected functional group. Novel compounds which can used in intramolecular photodeprotection are also provided. These compounds have a chromophore moiety bonded to a photocleavable group, which itself is bonded to a protected group. The compounds and compositions disclosed herein can be used in two-photon and multi-photon excitation.