MR. JOSEPH MATTHEW JOHNSON
Respite Care Facility at Whitehawk Ln, Phoenix, AZ

License number
Arizona 10826
Category
Respite Care Facility
Type
Respite Care, Mental Illness, Child
Address
Address
3720 W Whitehawk Ln, Phoenix, AZ 85086
Phone
(480) 221-6350
(623) 322-3166 (Fax)

Professional information

See more information about JOSEPH MATTHEW JOHNSON at trustoria.com
Joseph Johnson Photo 1
Joseph Johnson - Phoenix, AZ

Joseph Johnson - Phoenix, AZ

Work:
United Parcel Service
Package Handler/ Ramp Agent
Scuba Sciences Inc. - Phoenix, AZ
Cashier/Sales Associate/Janitor/Asst. Scuba Technician
Paint&Supply Surplus - Phoenix, AZ
Store Clerk/ Janitor
Education:
Glendale Community College - Glendale, AZ
Associate in Arts in Communication, Physics, Mathematics, Computer Information Systems
Moon Valley High School - Phoenix, AZ
High School Diploma in Marketing, Aviation, Military Science, Physical Science, Biology
Skills:
Group/Public Communication, Cash Handling, Sales, Marketing, Customer Service, Forklift, Heavy Machinery(aviation), Driving, Scuba Diving, Kayaking, Land Navigation (non-GPS), Microsoft Office Suite, Keyboarding etc...


Joseph Johnson Photo 2
Joseph Johnson - Phoenix, AZ

Joseph Johnson - Phoenix, AZ

Work:
ABL Healthcare Solutions
Consultant
ABL Healthcare Solutions
Chief Medical Officer
Arizona Integrated Physicians
Chief Medical Officer
Clear Choice Health Plans, Inc
Chief Medical Officer and Medical Director
Sierra Health Services
Vice President, Medical Affairs
Sun Health Corporation
Vice President and Chief Medical Officer
Sun Health MediSun
Chief Medical Officer
Sun Health Providers
Chairman of the Board and Medical Director
Private practice in General and Peripheral Vascular Surgery - Sun City, AZ CIGNA - Sun City, AZ Locum Tenens in General and peripheral vascular Surgery - Sunnyvale, CA Energetic and determined teacher-leader, who builds teams
Education:
Tulane University School of Public Health
Masters in Medical Management
American College of Physician Executives Penn State University
M.D. in Graduate
State University of New York at Buffalo - Buffalo, NY
B. A. in Psychology


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Chief Medical Officer At Arizona Integrated Physicians

Chief Medical Officer At Arizona Integrated Physicians

Position:
Chief Medical Officer at Arizona Integrated Physicians, Chief Medical Officer at Arizona Integrated Physicians
Location:
Phoenix, Arizona Area
Industry:
Health, Wellness and Fitness
Work:
Arizona Integrated Physicians - Chief Medical Officer


Joseph Johnson Photo 4
Owner, On Top Interactive

Owner, On Top Interactive

Position:
Owner at On Top Interactive
Location:
Phoenix, Arizona Area
Industry:
Marketing and Advertising
Work:
On Top Interactive - Owner


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Microwave Field Effect Transistor Structure

Microwave Field Effect Transistor Structure

US Patent:
6831332, Dec 14, 2004
Filed:
May 25, 2002
Appl. No.:
10/156605
Inventors:
Pablo DAnna - Redding CA
Joseph H. Johnson - Phoenix AZ
Assignee:
Sirenza Microdevices, Inc. - Broomfield CO
International Classification:
H01L 2976
US Classification:
257343, 257344, 257408, 257409, 257488
Abstract:
A microwave transistor structure comprising: (1) a substrate having a top surface; (2) a silicon semiconductor material of a first conductivity type; (3) a conductive gate; (4) a channel region of a second conductivity type; (5) a drain region of the second conductivity type; (6) a body of the first conductivity type; (7) a source region of the second conductivity type; (8) a shield plate region formed on the top surface of the silicon semiconductor material over a portion of the channel region, wherein the shield plate is adjacent and parallel to the drain region, and to the conductive gate region; and (9) a conductive plug region formed in the body region of the silicon semiconductor material, wherein the conductive plug region connects a lateral surface of the body region to the top surface of the substrate.


Joseph Michael Johnson Photo 6
Joseph Michael Johnson, Peoria AZ

Joseph Michael Johnson, Peoria AZ

Specialties:
Surgeon
Address:
16155 N 83Rd Ave, Peoria, AZ 85382
5315 E High St, Phoenix, AZ 85054
Education:
Pennsylvania State University, College of Medicine - Doctor of Medicine
Western Pennsylvania Hospital, The - Residency - Surgery


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High Performance Active And Passive Structures Based On Silicon Material Grown Epitaxially Or Bonded To Silicon Carbide Substrate

High Performance Active And Passive Structures Based On Silicon Material Grown Epitaxially Or Bonded To Silicon Carbide Substrate

US Patent:
2003015, Aug 14, 2003
Filed:
Feb 14, 2002
Appl. No.:
10/078588
Inventors:
Joseph Johnson - Phoenix AZ, US
Pablo D'Anna - Redding CA, US
Assignee:
XEMOD, Inc.
International Classification:
H01L031/0312
US Classification:
257/077000
Abstract:
The present invention discloses and claims the silicon carbide based silicon structure comprising: (1) a silicon carbide substrate, (2) a silicon semiconductor material having a top surface, and either bonded to the silicon carbide substrate via the bonding layer, or epitaxially grown on the silicon carbide substrate; and (3) at least one separation plug formed in the silicon semiconductor material. The separation plug extends from the top surface of the silicon semiconductor material into the silicon carbide substrate at a separation plug depth level, and is configured to block the coupling between at least two adjacent active/passive structures formed in the silicon semiconductor material.


Joseph Johnson Photo 8
High Performance Active And Passive Structures Based On Silicon Material Bonded To Silicon Carbide

High Performance Active And Passive Structures Based On Silicon Material Bonded To Silicon Carbide

US Patent:
8080826, Dec 20, 2011
Filed:
Sep 4, 2003
Appl. No.:
10/656613
Inventors:
Joseph H. Johnson - Phoenix AZ, US
Pablo D'Anna - Redding CA, US
Assignee:
RF Micro Devices, Inc. - Greensboro NC
International Classification:
H01L 31/0256
US Classification:
257 77, 257E29104
Abstract:
The present invention discloses and claims the Silicon Carbide based Silicon structure comprising: () a Silicon Carbide substrate, () a Silicon semiconductor material having a top surface, and either bonded to the Silicon Carbide substrate via the bonding layer, or epitaxially grown on the Silicon Carbide substrate; and () at least one separation plug formed in the Silicon semiconductor material. The single bonding layer, or either layer of the double bonding layer, is selected from the group consisting of: {a Silicon dioxide layer; a Silicon layer; a carbon layer; a Silicon germanium (SiGe) layer; a tungsten silicide layer; a titanium suicide layer; and a cobalt silicide layer}. The separation plug extends from the top surface of the Silicon semiconductor material into the Silicon Carbide substrate at a separation plug depth level, and is configured to block the coupling between at least two adjacent active/passive structures formed in the Silicon semiconductor material.


Joseph Johnson Photo 9
Microwave Transistor Structure Having Step Drain Region

Microwave Transistor Structure Having Step Drain Region

US Patent:
6838731, Jan 4, 2005
Filed:
Apr 9, 2003
Appl. No.:
10/410908
Inventors:
Pablo D'Anna - Redding CA, US
Joseph H. Johnson - Phoenix AZ, US
Assignee:
Sirenza Microdevices, Inc. - Broomfield CO
International Classification:
H01L 2976
US Classification:
257343, 257408, 257409, 257288
Abstract:
A microwave transistor structure having a step drain region comprising: (A) a substrate having a top surface; (B) a silicon semiconductor material of a first conductivity type, having a first dopant concentration and a top surface; (C) a conductive gate overlying and insulated from the top surface of the silicon semiconductor material; (D) at least one horizontal drain extension region of a second conductivity type and having a horizontal drain extension dopant concentration; (E) a step drain region formed in the silicon semiconductor material, and contacting the horizontal drain extension region; (F) a body region of the first conductivity type and having a body region dopant concentration; (G) a source region of the second conductivity type and having a source region dopant concentration; (H) a shield plate region formed on the top surface of the silicon semiconductor material over a portion of the horizontal drain extension region, the shield plate being adjacent and parallel to the horizontal drain extension region; the shield plate being adjacent and parallel to the conductive gate region; and (I) a conductive plug region.


Joseph Johnson Photo 10
Joseph Johnson, Phoenix AZ - Teacher

Joseph Johnson, Phoenix AZ - Teacher

Specialties:
Business
Work:
Grand Canyon University - Phoenix AZ