Inventors:
Paul D. Jackson - Scottsdale AZ
Stephen C. Schultz - Gilbert AZ
James E. Sanford - Mesa AZ
Glen Ong - Tempe AZ
Richard B. Rice - Chandler AZ
Parag S. Modi - Phoenix AZ
John G. Baca - Tempe AZ
Assignee:
Westech Systems, Inc. - Phoenix AZ
International Classification:
B24B 4918, B24B 5302
Abstract:
An axially rotating circular polishing pad is conditioned by a rotating end effector that has an abrasion disc in contact with a polishing surface of the pad. The end effector moves along a radius of the polishing pad surface at a velocity that varies to compensate for locations on the polishing pad surface having linear velocities that are directly related to their respective radii. A desired contact force is maintained between the end effector and the polishing pad surface.