JOHN BEVERLY WARREN
Pilots at Cp Woodbine Rd, Prt Jefferson Station, NY
License number
New York A2003221
Issued Date
May 2016
Expiration Date
May 2018
Category
Airmen
Type
Authorized Aircraft Instructor
Address
Address
23 Camp Woodbine Rd, Prt Jefferson Station, NY 11777
Professional information
Fiducial Marker For Correlating Images
US Patent:
7965820, Jun 21, 2011
Filed:
Aug 14, 2008
Appl. No.:
12/191525
Inventors:
Lisa Marie Miller - Rocky Point NY, US
Randy J. Smith - Wading River NY, US
John B. Warren - Port Jefferson NY, US
Donald Elliott - Hampton Bays NY, US
Randy J. Smith - Wading River NY, US
John B. Warren - Port Jefferson NY, US
Donald Elliott - Hampton Bays NY, US
Assignee:
Brookhaven Science Associates, LLC - Upton NY
International Classification:
G01N 23/223, G01N 23/04
US Classification:
378164, 378 44, 378 63
Abstract:
The invention relates to a fiducial marker having a marking grid that is used to correlate and view images produced by different imaging modalities or different imaging and viewing modalities. More specifically, the invention relates to the fiducial marking grid that has a grid pattern for producing either a viewing image and/or a first analytical image that can be overlaid with at least one other second analytical image in order to view a light path or to image different imaging modalities. Depending on the analysis, the grid pattern has a single layer of a certain thickness or at least two layers of certain thicknesses. In either case, the grid pattern is imageable by each imaging or viewing modality used in the analysis. Further, when viewing a light path, the light path of the analytical modality cannot be visualized by viewing modality (e. g. , a light microscope objective).
Method Of Fabricating A High Aspect Ratio Microstructure
US Patent:
6558868, May 6, 2003
Filed:
Feb 16, 2001
Appl. No.:
09/785053
Inventors:
John B. Warren - Port Jefferson NY
Assignee:
Brookhaven Science Associates, LLC - Upton NY
International Classification:
G03F 7004
US Classification:
430259, 430260, 4302711, 4302811, 430320
Abstract:
The present invention is for a method of fabricating a high aspect ratio, freestanding microstructure. The fabrication method modifies the exposure process for SU-8, an negative-acting, ultraviolet-sensitive photoresist used for microfabrication whereby a UV-absorbent glass substrate, chosen for complete absorption of UV radiation at 380 nanometers or less, is coated with a negative photoresist, exposed and developed according to standard practice. This UV absorbent glass enables the fabrication of cylindrical cavities in a negative photoresist microstructures that have aspect ratios of 8:1.