JEFFRY MARK BULSON
Pilots at Van Wyck Lk Rd, East Fishkill, NY
License number
New York A4282221
Issued Date
Feb 2016
Expiration Date
Feb 2018
Category
Airmen
Type
Authorized Aircraft Instructor
Address
Address
545 Van Wyck Lake Rd, East Fishkill, NY 12533
Professional information
Jeffry Bulson - Hopewell Junction, NY
Work:
EDEN PARK ILLUMINATION, INC
Senior R&D Engineer PANASONIC PLASMA DISPLAY LABORATORY OF AMERICA, INC., Formerly PLASMACO, INC - Highland, NY
Senior Research Scientist MATERIALS RESEARCH CORPORATION, Sputtering Systems Division - Congers, NY
Development Engineer Dutchess Community College - Poughkeepsie, NY
Adjunct Lecturer (Physics) Control Concepts/Liebert - Binghamton, NY
Independent Consultant CONTROL CONCEPTS CORPORATION, Subsidiary of LIEBERT CORP - Binghamton, NY
Staff Research Engineer MISSION RESEARCH CORPORATION, Advanced Technology Division - Newington, VA
Research Physicist/Engineer The University of Iowa - Iowa City, IA
Research/Teaching Assistant (Plasma Physics) Siena College - Loudonville, NY
Research Assistant/Tutor (Physics) Argonne National Laboratory - Argonne, IL
Undergraduate Research Participant
Senior R&D Engineer PANASONIC PLASMA DISPLAY LABORATORY OF AMERICA, INC., Formerly PLASMACO, INC - Highland, NY
Senior Research Scientist MATERIALS RESEARCH CORPORATION, Sputtering Systems Division - Congers, NY
Development Engineer Dutchess Community College - Poughkeepsie, NY
Adjunct Lecturer (Physics) Control Concepts/Liebert - Binghamton, NY
Independent Consultant CONTROL CONCEPTS CORPORATION, Subsidiary of LIEBERT CORP - Binghamton, NY
Staff Research Engineer MISSION RESEARCH CORPORATION, Advanced Technology Division - Newington, VA
Research Physicist/Engineer The University of Iowa - Iowa City, IA
Research/Teaching Assistant (Plasma Physics) Siena College - Loudonville, NY
Research Assistant/Tutor (Physics) Argonne National Laboratory - Argonne, IL
Undergraduate Research Participant
Education:
New York University - New York, NY
Physics The University of Iowa - Iowa City, IA
M. S. in Physics Siena College - Loudonville, NY
B. S. in Physics
Physics The University of Iowa - Iowa City, IA
M. S. in Physics Siena College - Loudonville, NY
B. S. in Physics
Skills:
SPECIALTIES: plasma physics; thin-film sputtering; process development; wave propagation; diagnostics; plasma sources; electromagnetics; RF; microwaves; lightning; EMP; materials research; chemical/electrical/optical characterization of thin films and surfaces; diagnostics/instrumentation; project/program management; laboratory management. TECHNICAL: SEM, FTIR spectroscopy, spectrophotometry, optical emission spectroscopy, spectroscopic ellipsometry, thermal desorption spectroscopy, residual gas analysis (mass spectroscopy), and network analyzer measurements. COMPUTER: Microsoft Word, Excel, PowerPoint, Access, Outlook, and Project; COSMOS, IES Amperes, Spice, PVDPro, TFCalc, SRIM, VacTran, and VacSim; MathCAD, OriginPro, and AutoCAD; LabView, LabWindows, IDL, FORTRAN, and BASIC
Method And Apparatus For Determining Composition And Concentration Of Contaminants On A Film Encapsulated In A Plasma Display Panel
US Patent:
2009011, May 7, 2009
Filed:
Oct 6, 2008
Appl. No.:
12/285462
Inventors:
Jeffry Mark Bulson - Hopewell Junction NY, US
International Classification:
G01N 21/55
US Classification:
356445
Abstract:
The instant disclosure describes a method for determining composition or concentration of contaminants on a film encapsulated inside a plasma display panel. The method further includes steps of transmitting a light beam through an internal reflection element into the substrate and a film coupled to a surface of the substrate to determine composition or concentration of contaminants formed on the film, receiving the light beam, reflected back from the surface of the film, through a second internal reflection element, and analyzing the light beam received through the second internal reflection element to determine the composition or the concentration of contaminants on the surface of the film.
Method Of Sealing And Spacing Planar Emissive Devices
US Patent:
2012020, Aug 9, 2012
Filed:
Jan 12, 2012
Appl. No.:
13/349426
Inventors:
WALTER E. MASON - ALFRED NY, US
JEFFRY M. BULSON - HOPEWELL JUNCTION NY, US
JEFFRY M. BULSON - HOPEWELL JUNCTION NY, US
International Classification:
B32B 5/16, B29C 65/52
US Classification:
428323, 1563096
Abstract:
A method of forming a planar emissive device, such as a flat fluorescent lamp or plasma display panel, including the steps of applying a frit paste including spherical spacers onto a broad face of a first planar substrate; setting the frit paste; coupling a second planar substrate to the frit paste; and flowing the frit paste to form a seal between the first and second substrate, wherein the gap size between the first and second substrate is substantially defined by the spacer diameter.
Planar Plasma Lamp And Method Of Manufacture
US Patent:
2012031, Dec 20, 2012
Filed:
May 18, 2012
Appl. No.:
13/475749
Inventors:
JEFFRY M. BULSON - HOPEWELL JUNCTION NY, US
JAY E. POGEMILLER - NEW PALTZ NY, US
DAVID B. DEHAVEN - URBANA IL, US
WALTER E. MASON - ALFRED NY, US
CYRUS M. HERRING - URBANA IL, US
SUNG-JIN PARK - CHAMPAIGN IL, US
JAY E. POGEMILLER - NEW PALTZ NY, US
DAVID B. DEHAVEN - URBANA IL, US
WALTER E. MASON - ALFRED NY, US
CYRUS M. HERRING - URBANA IL, US
SUNG-JIN PARK - CHAMPAIGN IL, US
International Classification:
H01J 61/42, H01J 9/00
US Classification:
313485, 445 29
Abstract:
A lamp including a first and second lamp substrate with a first and second external electrode, respectively, and a first and second internal phosphor coating, respectively, wherein the first phosphor coating is a phosphor monolayer. A method of manufacturing a lamp, including screen-printing a phosphor monolayer on a first lamp substrate; screen-printing a phosphor layer on a second lamp substrate; joining the phosphor-coated faces of the first and second lamp substrates together with a seal; and joining a first and second electrode to the uncoupled exterior faces of the first and second lamp substrates, respectively.