Janusz Murakowski
Electrician in Newark, DE

License number
Delaware TH-0005453
Issued Date
Apr 8, 2010
Expiration Date
Apr 8, 2011
Category
Electrical Examiners
Type
Homeowner's Permit
Address
Address 2
Newark, DE 19713

Professional information

Janusz Murakowski Photo 1

Micro-Ring Cavity Gyroscope With Magnetic Field Lock-In Minimization

US Patent:
6603558, Aug 5, 2003
Filed:
Jul 25, 2001
Appl. No.:
09/912944
Inventors:
Janusz A. Murakowski - Newark DE
Dennis W. Prather - Landenburg PA
Assignee:
University of Delaware - Newark DE
International Classification:
G01C 1966
US Classification:
356461, 356472
Abstract:
The invention is a compact optical gyroscope based on the Sagnac effect that combines a micro-ring cavity laser comprising a magneto-optical material and a magnetic field to circumvent the lock-in phenomenon at low rates of rotation. The invention also embodies novel processes for breaking lock-in using a transverse Faraday effect.


Janusz Murakowski Photo 2

Fabrication Of Quantum Dots Embedded In Three-Dimensional Photonic Crystal Lattice

US Patent:
7700936, Apr 20, 2010
Filed:
Jun 30, 2006
Appl. No.:
11/427832
Inventors:
Janusz Murakowski - Newark DE, US
Garrett Schneider - New Castle DE, US
Dennis W. Prather - Newark DE, US
Assignee:
University of Delaware - Wilmington DE
International Classification:
H01L 27/15
US Classification:
257 9, 257E29072, 257E29073, 257E29074, 257E29075, 257E29076, 257E29077, 257E29078, 257E29079, 257E2908, 257E29081, 257E29082, 257E29083, 257E29084, 257E29071, 257E33001, 257E33002, 257E33003, 257E33004, 257E33005, 257E33011, 257E33012, 257E33013, 257E33014, 257E33015, 257E33006, 257E33007, 257E33008, 257E33009, 257E3301, 257E33016, 257E33017, 257E33018, 977774, 977814, 977778, 372 39, 372 4301, 372 501, 372 5011, 385 2, 385 8, 385 10, 385 15, 385 37, 385129, 385130, 385131, 385132, 257 79, 257103, 257 14, 4283044, 4283126
Abstract:
In one embodiment, a method of producing an optoelectronic nanostructure includes preparing a substrate; providing a quantum well layer on the substrate; etching a volume of the substrate to produce a photonic crystal. The quantum dots are produced at multiple intersections of the quantum well layer within the photonic crystal. Multiple quantum well layers may also be provided so as to form multiple vertically aligned quantum dots. In another embodiment, an optoelectronic nanostructure includes a photonic crystal having a plurality of voids and interconnecting veins; a plurality of quantum dots arranged between the plurality of voids, wherein an electrical connection is provided to one or more of the plurality of quantum dots through an associated interconnecting vein.


Janusz Murakowski Photo 3

Process For Making Photonic Crystal Circuits Using An Electron Beam And Ultraviolet Lithography Combination

US Patent:
7255804, Aug 14, 2007
Filed:
Feb 14, 2003
Appl. No.:
10/504518
Inventors:
Dennis W. Prather - Landenberg PA, US
Janusz Murakowski - Newark DE, US
Assignee:
University of Delaware - Newark DE
International Classification:
G02B 6/00
US Classification:
216 24, 216 41, 216 49, 216 56, 216 75, 438 29, 430269, 430296, 430321, 385131, 359237
Abstract:
A process for making photonic crystal circuit and a photonic crystal circuit consisting of regularly-distributed holes in a high index dielectric material, and controllably-placed defects within this lattice, creating waveguides, cavities, etc. for photonic devices. The process is based upon the discovery that some positive ultraviolet (UV) photoresists are electron beam sensitive and behave like negative electron beam photoresists. This permits creation of photonic crystal circuits using a combination of electron beam and UV exposures. As a result, the process combines the best features of the two exposure methods: the high speed of UV exposure and the high resolution and control of the electron beam exposure. The process also eliminates the need for expensive photomasks.


Janusz Murakowski Photo 4

Etchless Fabrication Of Planar Photonic Crystal Structures In High Refractive Index Material

US Patent:
7157296, Jan 2, 2007
Filed:
Jan 16, 2004
Appl. No.:
10/707854
Inventors:
Janusz Murakowski - Newark DE, US
David Pustai - Newark DE, US
Dennis W. Prather - Landenberg PA, US
Assignee:
University of Delaware - Newark DE
International Classification:
H01L 21/00
US Classification:
438 31, 438 29, 372 64
Abstract:
A planar photonic bandgap structure includes a substrate and a suspended membrane with holes. A waveguiding film is applied directly on and registered with the membrane so as to avoid the holes. The film has an index of refraction which is higher than an index of refraction of the membrane to allow a waveguiding function to occur within the film. A method of forming a planar photonic bandgap structure includes applying first and second films on a substrate and exposing a pattern of a plurality of holes on the second film. The exposed pattern is developed using a solvent where the dissolution rate of the first film is greater than a dissolution rate of the second film. A waveguiding layer is applied onto a top surface of a suspended membrane such that the layer has an index of refraction greater than an index of refraction of the suspended membrane.


Janusz Murakowski Photo 5

Fabrication Of Three-Dimensional Photonic Crystals In Gallium Arsenide-Based Material

US Patent:
2006028, Dec 21, 2006
Filed:
Jun 15, 2006
Appl. No.:
11/424362
Inventors:
Janusz Murakowski - Newark DE, US
Christopher Schuetz - Newark DE, US
Dennis Prather - Newark DE, US
Assignee:
University of Delaware - Newark DE
International Classification:
H01L 21/00
US Classification:
438022000
Abstract:
The present invention is an efficient method for the fabrication of three-dimensional structures in GaAs-based materials. The method is particularly suitable for the realization of 3D photonic crystals. The method relies on the observation that the oxidation rate of GaAAs in water-vapor atmosphere is a strong function of the aluminum content in the alloy. Thus, a stack of GaAAs layers with varying concentration of Ais grown on GaAs substrate. The top surface is patterned with an array of holes, which are then transferred to the underlying layers by dry etching. Subjecting the so-prepared structure to oxidation in water vapor atmosphere at an elevated temperature results in lateral oxidation of the material exposed by the etched holes. The lateral oxidation depth depends on aluminum content in a particular layer. The oxide is then removed by an aqueous solution of hydrofluoric acid and a three-dimensional array of voids ensues. The shape of the voids depends on the variation of aluminum content in the layers of the stack. Depending on the 2D pattern on top surface of the structure, various arrays of voids can be realized.


Janusz Murakowski Photo 6

Method For Fabricating Optical Devices In Photonic Crystal Structures

US Patent:
7384724, Jun 10, 2008
Filed:
Aug 26, 2003
Appl. No.:
10/525763
Inventors:
Janusz Murakowski - Newark DE, US
Dennis W. Prather - Newark DE, US
Assignee:
University of Delaware - Newark DE
International Classification:
G03C 5/00, G03H 1/02
US Classification:
430296, 430 2, 430312, 430319, 430321, 430394, 430942, 359 3
Abstract:
A method for manufacturing optical components in a three-dimensional photonic crystal lattice. A first resist () is coated on a substrate () and exposed to an e-beam (), to produce an imaged area (). Another resist coating is applied to thicken the resist () and an interference exposure () is used to image the result. This is developed to form periodic voids (), which may be filled with a materials having a high refractive index to form a pattern ( and ) when the resist () is removed.


Janusz Murakowski Photo 7

Combination Control For Vehicles

US Patent:
5997438, Dec 7, 1999
Filed:
Aug 27, 1996
Appl. No.:
8/703899
Inventors:
Janusz A Murakowski - Newark DE
International Classification:
B60K 4120
US Classification:
477213
Abstract:
A simple foot operated mechanism for controlling both throttle and brakes of a motor vehicle is disclosed. The throttle is controlled by pivoting foot at the ankle. A locking mechanism is used, which provides rigid support for the driver's foot while operating the throttle. The brakes are applied by pushing the heel down to release the locking mechanism, and straightening the knee. The leg movement from accelerating to braking is a natural and smooth one, and in a natural way cuts the fuel to the engine before brakes are applied. Once brakes are applied it is possible to open the throttle valve without necessarily releasing brakes.


Janusz Murakowski Photo 8

Micro Polymerization Catalyzed By External Acid Source For Chemical Lithography

US Patent:
2006018, Aug 24, 2006
Filed:
Jan 12, 2006
Appl. No.:
11/330088
Inventors:
Peng Yao - Newark DE, US
Dennis Prather - Newark DE, US
Janusz Murakowski - Newark DE, US
Garrett Schneider - New Castle DE, US
International Classification:
G02F 1/13
US Classification:
349187000
Abstract:
A method for generating images in polymers comprising: preparing a template with an extruding desired pattern; contacting a surface of a polymer with a desired pattern of the extruded surface of the template; treating the surface of the polymer with at least one of a liquid acid and vapor; treating the surface of the polymer with a high temperature for crosslinking; separating the template and polymer and revealing an acid imprint of the desired pattern on the surface of the polymer; baking the polymer to drive diffusion of the acid; and developing the polymer with at least one of a wet and dry process to produce a negative pattern in the polymer.


Janusz Murakowski Photo 9

Electromagnetic/Optical Tweezers Using A Full 3D Negative-Refraction Flat Lens

US Patent:
7718953, May 18, 2010
Filed:
Apr 12, 2007
Appl. No.:
11/786670
Inventors:
Dennis W. Prather - Newark DE, US
Zhaolin Lu - Newark DE, US
Janusz Murakowski - Newark DE, US
Shouyuan Shi - Newark DE, US
Garrett Schneider - New Castle DE, US
Assignee:
University of Delaware - Newark DE
International Classification:
H05H 3/04
US Classification:
250251, 977901, 359614, 359615, 359601
Abstract:
Described herein are electromagnetic traps or tweezers. Desired results are achieved by combining two recently developed techniques, 3D negative refraction flat lenses (3DNRFLs) and optical tweezers. The very unique advantages of using 3DNRFLs for electromagnetic traps have been demonstrated. Super-resolution and short focal distance of the flat lens result in a highly focused and strongly convergent beam, which is a key requirement for a stable and accurate electromagnetic trap. The translation symmetry of 3DNRFL provides translation-invariance for imaging, which allows an electromagnetic trap to be translated without moving the lens, and permits a trap array by using multiple sources with a single lens.