JAMES MARSH HAMILTON
Pilots at Southwood Ave, Sunnyvale, CA

License number
California A0762247
Category
Airmen
Type
Authorized Aircraft Instructor
Address
Address
480 Southwood Ave, Sunnyvale, CA 94086

Professional information

James Hamilton Photo 1

Method And System For Printing Aligned Nanowires And Other Electrical Devices

US Patent:
7892610, Feb 22, 2011
Filed:
May 2, 2008
Appl. No.:
12/114446
Inventors:
J. Wallace Parce - Palo Alto CA, US
James M. Hamilton - Sunnyvale CA, US
Samuel Martin - Cupertino CA, US
Erik Freer - Camptell CA, US
Assignee:
Nanosys, Inc. - Palo Alto CA
International Classification:
B05D 1/04
US Classification:
427475, 427458, 427466
Abstract:
Methods and systems for applying nanowires and electrical devices to surfaces are described. In a first aspect, at least one nanowire is provided proximate to an electrode pair. An electric field is generated by electrodes of the electrode pair to associate the at least one nanowire with the electrodes. The electrode pair is aligned with a region of the destination surface. The at least one nanowire is deposited from the electrode pair to the region. In another aspect, a plurality of electrical devices is provided proximate to an electrode pair. An electric field is generated by electrodes of the electrode pair to associate an electrical device of the plurality of electrical devices with the electrodes. The electrode pair is aligned with a region of the destination surface. The electrical device is deposited from the electrode pair to the region.


James Hamilton Photo 2

Systems And Methods For Harvesting And Integrating Nanowires

US Patent:
2008004, Feb 21, 2008
Filed:
Aug 16, 2007
Appl. No.:
11/839778
Inventors:
Linda Romano - Sunnyvale CA, US
Jian Chen - Mountain View CA, US
Xiangfeng Duan - Mountain View CA, US
Robert Dubrow - San Carlos CA, US
Stephen Empedocles - Menlo Park CA, US
Jay Goldman - Mountain View CA, US
James Hamilton - Sunnyvale CA, US
David Heald - Solvang CA, US
Francesco Lemmi - Sunnyvale CA, US
Chunming Niu - Palo Alto CA, US
Yaoling Pan - Union City CA, US
George Pontis - Redwood City CA, US
Vijendra Sahi - Menlo Park CA, US
Erik Scher - San Francisco CA, US
David Stumbo - Belmont CA, US
Jeffery Whiteford - Belmont CA, US
Assignee:
NANOSYS, INC. - Palo Alto CA
International Classification:
B32B 9/00, H01B 13/00
US Classification:
216013000, 428384000, 977762000, 977888000
Abstract:
The present invention is directed to methods to harvest, integrate and exploit nanomaterials, and particularly elongated nanowire materials. The invention provides methods for harvesting nanowires that include selectively etching a sacrificial layer placed on a nanowire growth substrate to remove nanowires. The invention also provides methods for integrating nanowires into electronic devices that include placing an outer surface of a cylinder in contact with a fluid suspension of nanowires and rolling the nanowire coated cylinder to deposit nanowires onto a surface. Methods are also provided to deposit nanowires using an ink-jet printer or an aperture to align nanowires. Additional aspects of the invention provide methods for preventing gate shorts in nanowire based transistors. Additional methods for harvesting and integrating nanowires are provided.


James Hamilton Photo 3

Method And System For Printing Aligned Nanowires And Other Electrical Devices

US Patent:
2011016, Jul 7, 2011
Filed:
Jan 19, 2011
Appl. No.:
13/009675
Inventors:
J. Wallace Parce - Palo Alto CA, US
James M. Hamilton - Sunnyvale CA, US
Samuel Martin - Cupertino CA, US
Erik Freer - Campbell CA, US
Assignee:
NANOSYS, INC. - Palo Alto CA
International Classification:
B05D 1/04, B05B 5/025
US Classification:
427466, 118621, 427475
Abstract:
Methods and systems for applying nanowires and electrical devices to surfaces are described. In a first aspect, at least one nanowire is provided proximate to an electrode pair. An electric field is generated by electrodes of the electrode pair to associate the at least one nanowire with the electrodes. The electrode pair is aligned with a region of the destination surface. The at least one nanowire is deposited from the electrode pair to the region. In another aspect, a plurality of electrical devices is provided proximate to an electrode pair. An electric field is generated by electrodes of the electrode pair to associate an electrical device of the plurality of electrical devices with the electrodes. The electrode pair is aligned with a region of the destination surface. The electrical device is deposited from the electrode pair to the region.


James Hamilton Photo 4

Systems And Methods For Harvesting And Reducing Contamination In Nanowires

US Patent:
7741197, Jun 22, 2010
Filed:
Dec 20, 2006
Appl. No.:
11/643025
Inventors:
Xiangfeng Duan - Mountain View CA, US
Paul Bernatis - Sunnyvale CA, US
Alice Fischer-Colbrie - Redwood City CA, US
James M. Hamilton - Sunnyvale CA, US
Francesco Lemmi - Sunnyvale CA, US
Yaoling Pan - Union City CA, US
J. Wallace Parce - Palo Alto CA, US
David P. Stumbo - Belmont CA, US
Assignee:
Nanosys, Inc. - Palo Alto CA
International Classification:
H01L 21/20, H01L 21/36
US Classification:
438478, 438487, 977700, 977742
Abstract:
The present invention is directed to methods to harvest, integrate and exploit nanomaterials, and particularly elongated nanowire materials. The invention provides methods for harvesting nanowires that include selectively etching a sacrificial layer placed on a nanowire growth substrate to remove nanowires. The invention also provides methods for integrating nanowires into electronic devices that include placing an outer surface of a cylinder in contact with a fluid suspension of nanowires and rolling the nanowire coated cylinder to deposit nanowires onto a surface. Methods are also provided to deposit nanowires using an ink-jet printer or an aperture to align nanowires. Additional aspects of the invention provide methods for preventing gate shorts in nanowire based transistors. Additional methods for harvesting and integrating nanowires are provided.


James Hamilton Photo 5

Methods And Systems For Electric Field Deposition Of Nanowires And Other Devices

US Patent:
2012013, May 31, 2012
Filed:
May 25, 2010
Appl. No.:
13/322117
Inventors:
Erik Freer - Campbell CA, US
James M. Hamilton - Sunnyvale CA, US
David P. Stumbo - Pleasanton CA, US
Kenji Komiya - Osaka, JP
Akihide Shibata - Osaka, JP
Assignee:
SHARP KABUSHIKI KAISHA - Osaka
NANOSYS, INC. - Palo Alto CA
International Classification:
B05D 5/00, B05C 9/12, B05D 3/14, B82Y 30/00
US Classification:
427532, 427 58, 118620, 977762
Abstract:
Methods, systems, and apparatuses for nanowire deposition are provided. A deposition system includes an enclosed flow channel, an inlet port, and an electrical signal source. The inlet port provides a suspension that includes nanowires into the channel. The electrical signal source is coupled to an electrode pair in the channel to generate an electric field to associate at least one nanowire from the suspension with the electrode pair. The deposition system may include various further features, including being configured to receive multiple solution types, having various electrode geometries, having a rotatable flow channel, having additional electrical conductors, and further aspects.


James Hamilton Photo 6

Methods For Nanowire Alignment And Deposition

US Patent:
8252164, Aug 28, 2012
Filed:
May 23, 2011
Appl. No.:
13/113680
Inventors:
Samuel Martin - Cupertino CA, US
Xiangfeng Duan - Mountain View CA, US
Katsumasa Fujii - Yamatokoriyama, JP
James M. Hamilton - Sunnyvale CA, US
Hiroshi Iwata - Nara, JP
Francisco Leon - Palo Alto CA, US
Jeffrey Miller - Los Altos Hills CA, US
Tetsu Negishi - Sunnyvale CA, US
Hiroshi Ohki - Tokyo, JP
J. Wallace Parce - Palo Alto CA, US
Paul John Schuele - Washougal WA, US
Akihide Shibata - Santa Clara CA, US
David P. Stumbo - Belmont CA, US
Yasunobu Okada - Gifu, JP
Assignee:
Nanosys, Inc. - Palo Alto CA
Sharp Kabushiki Kaisha - Osaka
International Classification:
C25D 13/02
US Classification:
204622, 204477, 977883
Abstract:
The present invention provides methods and systems for nanowire alignment and deposition. Energizing (e. g. , an alternating current electric field) is used to align and associate nanowires with electrodes. By modulating the energizing, the nanowires are coupled to the electrodes such that they remain in place during subsequent wash and drying steps. The invention also provides methods for transferring nanowires from one substrate to another in order to prepare various device substrates. The present invention also provides methods for monitoring and controlling the number of nanowires deposited at a particular electrode pair, as well as methods for manipulating nanowires in solution.


James Hamilton Photo 7

Nanowire-Based Sensor Configurations

US Patent:
7910064, Mar 22, 2011
Filed:
Apr 6, 2006
Appl. No.:
11/399218
Inventors:
James M. Hamilton - Sunnyvale CA, US
Robert S. Dubrow - San Carlos CA, US
Calvin Y. H. Chow - Portola Valley CA, US
Assignee:
Nanosys, Inc. - Palo Alto CA
International Classification:
G01N 27/00
US Classification:
422 8201, 422 50, 422 8202, 436518, 436524, 436525, 435 4, 435 71, 4352831, 4352871, 4352872
Abstract:
This invention provides nanowire based molecular sensors and methods for detecting analytes in a microfluidic system. Methods for sensing analytes include detecting changed electrical parameters associated with contact of a nanowire with the analyte in a microfluidic system. Sensors of the invention include nanowires mounted in microchambers of a microfluidic system in electrical contact with the detector, whereby electrical parameter changes induced in the nanowire by the analyte can be monitored by the detector.


James Hamilton Photo 8

Methods Of Positioning And/Or Orienting Nanostructures

US Patent:
7164209, Jan 16, 2007
Filed:
Dec 1, 2004
Appl. No.:
11/000557
Inventors:
Xiangfeng Duan - Mountain View CA, US
R. Hugh Daniels - Mountain View CA, US
Chunming Niu - Palo Alto CA, US
Vijendra Sahi - Menlo Park CA, US
James M. Hamilton - Sunnyvale CA, US
Linda T. Romano - Sunnyvale CA, US
Assignee:
Nanosys, Inc. - Palo Alto CA
International Classification:
H01L 23/48, H01L 23/52, H01L 29/41
US Classification:
257784, 977762
Abstract:
Methods of positioning and orienting nanostructures, and particularly nanowires, on surfaces for subsequent use or integration. The methods utilize mask based processes alone or in combination with flow based alignment of the nanostructures to provide oriented and positioned nanostructures on surfaces. Also provided are populations of positioned and/or oriented nanostructures, devices that include populations of positioned and/or oriented nanostructures, systems for positioning and/or orienting nanostructures, and related devices, systems and methods.


James Hamilton Photo 9

Pipettor Systems And Components

US Patent:
2003022, Dec 4, 2003
Filed:
Feb 12, 2003
Appl. No.:
10/365960
Inventors:
Joseph Jackson - El Granada CA, US
James Hamilton - Sunnyvale CA, US
Samuel Marquiss - Santa Clara CA, US
Charles Godin - Palo Alto CA, US
Assignee:
Molecular Devices Corp.
International Classification:
B01L003/02
US Classification:
422/100000
Abstract:
This invention relates to pipette systems for transferring fluid between fluid receptacles; dispensing fluid from a fluid reservoir to a fluid receptacle and the reverse; and systems capable of both transferring and dispensing fluids wherein the pipette system incorporates a flexible sealing element.


James Hamilton Photo 10

Methods Of Positioning And/Or Orienting Nanostructures

US Patent:
7422980, Sep 9, 2008
Filed:
Nov 21, 2006
Appl. No.:
11/602784
Inventors:
Xiangfeng Duan - Mountain View CA, US
R. Hugh Daniels - Mountain View CA, US
Chunming Niu - Palo Alto CA, US
Vijendra Sahi - Menlo Park CA, US
James M. Hamilton - Sunnyvale CA, US
Linda T. Romano - Sunnyvale CA, US
Assignee:
Nanosys, Inc. - Palo Alto CA
International Classification:
H01L 21/44, H01L 21/441
US Classification:
438666, 977857, 977858
Abstract:
Methods of positioning and orienting nanostructures, and particularly nanowires, on surfaces for subsequent use or integration. The methods utilize mask based processes alone or in combination with flow based alignment of the nanostructures to provide oriented and positioned nanostructures on surfaces. Also provided are populations of positioned and/or oriented nanostructures, devices that include populations of positioned and/or oriented nanostructures, systems for positioning and/or orienting nanostructures, and related devices, systems and methods.