JAMES L FILSON
Real Estate Commission in Wexford, PA

6346195, Feb 12, 2002

Jul 10, 1998

09/113982

James L. Filson - Wexford PA
Philip M. Kemp - Jefferson Township PA
Stanley R. Kaars - Gibsonia PA

U.S. Filter Corporation - Palm Desert CA

C02F 900

210668, 210670, 210688, 210912

A novel process and apparatus are disclosed for cleaning wastewater containing metal ions in solution, hydrogen peroxide, and high solids, e. g. , greater than about 50 mg/l particulate solids. A carbon adsorption column removes hydrogen peroxide in the wastewater feed containing high solids. A ion exchange unit removes the metal ions from solution. The process and apparatus remove metal ions such as copper from a high solids byproduct polishing slurry from the chemical mechanical polishing (CMP) of integrated circuit microchips to form an environmentally clean wastewater discharge.

6818129, Nov 16, 2004

Dec 14, 2001

10/017077

Philip M. Kemp - Jefferson Township PA
James L. Filson - Wexford PA
Stanley R. Kaars - Gibsonia PA

USFilter Corporation - Warrendale PA

C02F 900

210251, 210284

A novel process and apparatus are disclosed for cleaning wastewater containing metal ions in solution, hydrogen peroxide, and high solids, e. g. , greater than about 50 mg/l particulate solids. A carbon adsorption column removes hydrogen peroxide in the wastewater feed containing high solids. A ion exchange unit removes the metal ions from solution. The process and apparatus remove metal ions such as copper from a high solids byproduct polishing slurry from the chemical mechanical polishing (CMP) of integrated circuit microchips to form an environmentally clean wastewater discharge.

5645727, Jul 8, 1997

May 16, 1996

8/648919

Ramesh R. Bhave - Cranberry Township PA
James L. Filson - Wexford PA

Illinois Water Treatment, Inc. - Warrendale PA

B01D 6100

210651

Particle filtration of a feed of highly corrosive ultra pure water and contaminants is disclosed through a metal oxide membrane on ceramic support in combination with on-line ozonation. In one aspect, the filtering of ultra pure water includes passing the feed cross-flow through a multichannel sintered monolithic metal oxide membrane on ceramic support to form a permeate of particle-free ultra pure water. Although high recoveries per pass rates were used, no detectable metal ions including aluminum, zirconium, or yttrium ions were found in the ultra pure water permeate. The apparatus and process of the present invention for filtering ultra pure water include cross-flow filtration using multichannel monolithic ceramic membranes at suitable pore sizes in a total chemical process system including elevated temperatures and on-line ozonation sterilization of the ceramic membrane particle filter in high purity water applications for electronics manufacturing.

5518624, May 21, 1996

May 6, 1994

8/239218

James L. Filson - Wexford PA
Wesley R. Carrera - San Antonio TX
Ramesh R. Bhave - Cranberry Township PA

Illinois Water Treatment, Inc. - Warrendale PA

B01D 6100

210651

Ceramic filtration of a feed solution of ultra pure water and particle contaminants is disclosed through a metal oxide membrane on ceramic support. In one aspect, the filtering of ultra pure water from a feed solution containing ultra pure water and contaminant particles includes passing the feed solution cross-flow through a multi-channel sintered monolithic metal oxide membrane on ceramic support to form a permeate of particle-free ultra pure water. The sintered metal oxide membrane has a nominal pore size in the range of about 50 to 200 Angstroms. Although high recoveries per pass rates were used, no detectable aluminum ions were found in the ultra pure water. In another aspect, the apparatus and process of the present invention for filtering ultra pure water includes cross-flow filtration using multichannel monolithic ceramic membranes at suitable pore sizes in a total chemical process system including ozonation sterilization of the ceramic membrane particle filter in water purification applications for electronics manufacturing.

2002007, Jun 27, 2002

Oct 31, 2001

10/001543

Frank Sassaman - Franklin Township PA, US
James Filson - Wexford PA, US
Philip Kemp - Jefferson Township PA, US

B01D015/00

210/666000

A novel process and apparatus are disclosed for cleaning wastewater containing metal ions in solution, hydrogen peroxide, and high solids, e.g., greater than about 50 mg/l particulate solids. A carbon adsorption column removes hydrogen peroxide in the wastewater feed containing high solids. A chemical precipitation unit removes the metal ions from solution. The process and apparatus remove metal ions such as copper from a high solids byproduct polishing slurry from the chemical mechanical polishing (CMP) of integrated circuit microchips to form an environmentally clean wastewater discharge.

6315906, Nov 13, 2001

Jul 10, 1998

9/113981

Frank L. Sassaman - Franklin Township PA
James L. Filson - Wexford PA
Philip M. Kemp - Jefferson Township PA

United States Filter Corporation - Palm Desert CA

C02F 900

210666

A novel process and apparatus are disclosed for cleaning wastewater containing metal ions in solution, hydrogen peroxide, and high solids, e. g. , greater than about 50 mg/l particulate solids. A carbon adsorption column removes hydrogen peroxide in the wastewater feed containing high solids. A chemical precipitation unit removes the metal ions from solution. The process and apparatus remove metal ions such as copper from a high solids byproduct polishing slurry from the chemical mechanical polishing (CMP) of integrated circuit microchips to form an environmentally clean wastewater discharge.