HONG C KIM, RPT
Physical Therapy at De Anza Blvd, San Jose, CA
License number
California PT 18716
Category
Restorative Service Providers
Type
Physical Therapist
Address
Address
992 S De Anza Blvd SUITE 103, San Jose, CA 95129
Phone
(408) 252-7575
(408) 252-7577 (Fax)
(408) 252-7577 (Fax)
Personal information
See more information about HONG C KIM at radaris.comName
Address
Phone
4517 Trevino Way, Buena Park, CA 90621
4540 Alveo Rd, La Canada, CA 91011
4411 W 5Th St, Los Angeles, CA 90020
4788 Steele St, Torrance, CA 90503
438 Monroe, Irvine, CA 92620
Professional information
Hong C Kim, San Jose CA - RPT
Specialties:
Physical Therapy
Address:
992 S De Anza Blvd SUITE 103, San Jose 95129
(408) 252-7575 (Phone), (408) 252-7577 (Fax)
(408) 252-7575 (Phone), (408) 252-7577 (Fax)
Languages:
English
Hong C Kim, San Jose CA
Specialties:
Physical Therapist
Address:
992 S De Anza Blvd, San Jose, CA 95129
Voltage Level Shifting With Reduced Power Consumption
US Patent:
2011027, Nov 10, 2011
Filed:
Feb 4, 2011
Appl. No.:
13/021623
Inventors:
Chor Yin Chia - San Jose CA, US
Hong Joong Kim - San Jose CA, US
Hong Joong Kim - San Jose CA, US
Assignee:
INTERSIL AMERICAS INC. - Milpitas CA
International Classification:
G06F 3/038, H03L 5/00
US Classification:
345212, 327333
Abstract:
In an embodiment, a voltage level shifter circuit includes a first terminal configured to be connected to a high voltage supply rail (Vs+), a second terminal configured to be connected to a low voltage supply rail (Vs−), and an output voltage (V) terminal. The voltage level shifter can also include a compensation voltage (V) node. Additionally, the voltage level shifter includes a plurality of switches configurable in a plurality of configurations, and control circuitry configured to control the switches so that in at least one of the configurations a load connected to the output voltage (V) terminal does not draw any power from the low voltage supply rail (Vs−) and the high voltage supply rail (Vs+). The load can be, e.g., a gate drive circuit of a display panel, such as a thin film transistor-liquid crystal display (TFT-LCD) panel, but is not limited thereto.
Detecting Plasma Chamber Malfunction
US Patent:
2010024, Sep 30, 2010
Filed:
Mar 19, 2010
Appl. No.:
12/661699
Inventors:
Beom Soo Park - San Jose CA, US
Hong Soon Kim - San Jose CA, US
Soo Young Choi - Fremont CA, US
James Hoffman - San Jose CA, US
Suhail Anwar - San Jose CA, US
John M. White - Hayward CA, US
Hong Soon Kim - San Jose CA, US
Soo Young Choi - Fremont CA, US
James Hoffman - San Jose CA, US
Suhail Anwar - San Jose CA, US
John M. White - Hayward CA, US
International Classification:
G08B 21/00
US Classification:
340540
Abstract:
Malfunction of a component within an RF-powered plasma chamber is detected by observing an operating condition of the plasma chamber and detecting when the operating condition deviates from a previously observed range bounded by lower and upper limits. The lower and upper limits are determined by observing the minimum and maximum values of that operating condition during the processing of workpieces throughout one or more plasma chamber cleaning cycles immediately preceding the most recent cleaning of the plasma chamber.
Dynamic Routing Control Methods And Systems For A Cluster Tool
US Patent:
2013022, Aug 29, 2013
Filed:
Aug 24, 2012
Appl. No.:
13/594750
Inventors:
James Hoffman - San Jose CA, US
Hong Soon Kim - San Jose CA, US
Atsushi Kitani - Nara, JP
Hong Soon Kim - San Jose CA, US
Atsushi Kitani - Nara, JP
Assignee:
APPLIED MATERIALS, INC. - Santa Clara CA
International Classification:
B25J 9/16
US Classification:
700228
Abstract:
Systems, methods, and apparatus are provided for operating a cluster tool including receiving recipe time data; receiving transfer time data; receiving process programs and associated substrate lots wherein the process programs include a plurality of sequences; determining cluster tool chambers associated with sequences that are bottleneck sequences; setting equipment constant values for components of the cluster tool to implement transfer priorities wherein the chambers associated with bottleneck sequences are given highest priority; executing a next sequence based on the transfer priorities; and repeating the determining, setting and executing for each remaining sequence. Numerous additional aspects are disclosed.
Flexible Process Condition Monitoring
US Patent:
2011019, Aug 4, 2011
Filed:
Feb 2, 2011
Appl. No.:
13/019838
Inventors:
Hong Soon Kim - San Jose CA, US
James Hoffman - San Jose CA, US
Beom Soo Park - San Jose CA, US
James Hoffman - San Jose CA, US
Beom Soo Park - San Jose CA, US
Assignee:
APPLIED MATERIALS, INC. - Santa Clara CA
International Classification:
G06F 19/00
US Classification:
700110
Abstract:
The present invention generally relates to a method for flexible process condition monitoring. In a process that utilizes RF power, the RF power may be applied at different levels during different points in the process. Software may be programmed to facilitate the monitoring of the different points in the process so that the acceptable deviation range of the RF power for each point in the process may be set to different values. For example, one phase of the process may permit a greater range of RF power deviation while a second phase may be much more particular and permit very little deviation. By programming software to permit each phase of the process to be uniquely monitored, a more precise RF process may be obtained.
Frequency Monitoring To Detect Plasma Process Abnormality
US Patent:
8174400, May 8, 2012
Filed:
Mar 7, 2011
Appl. No.:
13/042408
Inventors:
Beom Soo Park - San Jose CA, US
Soo Young Choi - Fremont CA, US
John M. White - Hayward CA, US
Hong Soon Kim - San Jose CA, US
James Hoffman - San Jose CA, US
Soo Young Choi - Fremont CA, US
John M. White - Hayward CA, US
Hong Soon Kim - San Jose CA, US
James Hoffman - San Jose CA, US
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
G08B 21/00
US Classification:
340658, 31511121, 340540, 340679
Abstract:
Abnormal conditions within an RF-powered plasma process chamber are detected by detecting whether the frequency of a variable-frequency RF power supply moves outside established lower and upper limits. In a first aspect, a first pair of lower and upper limits are established as a function of the frequency of the power supply sampled after a new process step begins or after a sample control signal changes state. In a second aspect, a second pair of lower and upper limits are not adapted to the frequency of the power supply. Both aspects preferably are used together to detect different occurrences of abnormal conditions.
Systems And Methods For Self Testing A Voltage Controlled Oscillator In An Open Loop Configuration
US Patent:
8143958, Mar 27, 2012
Filed:
May 20, 2009
Appl. No.:
12/469548
Inventors:
Jeongsik Yang - Cupertino CA, US
Jin Wook Kim - San Jose CA, US
Hong Sun Kim - San Jose CA, US
Sang-Oh Lee - Cupertino CA, US
Jin Wook Kim - San Jose CA, US
Hong Sun Kim - San Jose CA, US
Sang-Oh Lee - Cupertino CA, US
Assignee:
QUALCOMM, Incorporated - San Diego CA
International Classification:
H03L 7/099, G01R 23/00
US Classification:
331 44, 331 1 A, 331179
Abstract:
Methods and apparatus for self testing a multiband voltage controlled oscillator (VCO) are disclosed. A tuning voltage of the VCO is adjusted where the output of the VCO does not affect the input to the VCO. Frequency bands in the VCO are selected. Output frequencies of the VCO are measured.
Reconfigurable Lna For Increased Jammer Rejection
US Patent:
2013028, Oct 24, 2013
Filed:
Apr 18, 2012
Appl. No.:
13/450120
Inventors:
Cheng-Han Wang - San Jose CA, US
Liang Zhao - Sunnyvale CA, US
Hong Sun Kim - San Jose CA, US
Jin-Su Ko - San Jose CA, US
Liang Zhao - Sunnyvale CA, US
Hong Sun Kim - San Jose CA, US
Jin-Su Ko - San Jose CA, US
Assignee:
QUALCOMM Incorporated - San Diego CA
International Classification:
H04B 1/10
US Classification:
455311
Abstract:
A reconfigurable LNA for increased jammer rejection is disclosed. An exemplary embodiment includes an LNA having a tunable resonant frequency, and a detector configured to output a control signal to tune the resonant frequency of the LNA to increase jammer suppression. An exemplary method includes detecting if a jammer is present, tuning a resonant frequency of an LNA away from the jammer to increase jammer rejection if the jammer is present, and tuning the resonant frequency of the LNA to a selected operating frequency if the jammer is not present.
Systematic Intermodulation Distortion Calibration For A Differential Lna
US Patent:
2012032, Dec 27, 2012
Filed:
Jun 23, 2011
Appl. No.:
13/167655
Inventors:
Cheng-Han Wang - San Jose CA, US
Liang Zhao - Sunnyvale CA, US
Hong Sun Kim - San Jose CA, US
I-Hsiang Lin - Los Altos CA, US
Liang Zhao - Sunnyvale CA, US
Hong Sun Kim - San Jose CA, US
I-Hsiang Lin - Los Altos CA, US
Assignee:
QUALCOMM INCORPORATED - San Diego CA
International Classification:
H03F 1/26, H03F 1/22
US Classification:
330296
Abstract:
Systematic IM2 calibration for a differential LNA is disclosed. In an aspect, an apparatus includes an amplifier configured to output an amplified signal having a level of systematic pre-mixer IM2 distortion, a detector configured to detect the level of the systematic pre-mixer IM2 distortion in the amplified signal, and a bias signal generator configured to generate at least one bias signal configured to adjust the amplifier to reduce the level of the systematic pre-mixer IM2 distortion.