ERIC MATTHEW PANNING
Pilots at Clearbrook St, Beaverton, OR
License number
Oregon A4136791
Issued Date
Jan 2016
Expiration Date
Jan 2018
Category
Airmen
Type
Authorized Aircraft Instructor
Address
Address
5593 SE Clearbrook St, Beaverton, OR 97123
Personal information
See more information about ERIC MATTHEW PANNING at radaris.comName
Address
Phone
5593 SE Clearbrook St, Hillsboro, OR 97123
6783 NE Vinings Way APT 1126, Hillsboro, OR 97124
5593 Clearbrook St, Hillsboro, OR 97123
Professional information
See more information about ERIC MATTHEW PANNING at trustoria.com
Reflective Optical Illumination Collector
Reflective Optical Illumination Collector
US Patent:
2008007, Mar 27, 2008
Filed:
Jul 21, 2006
Appl. No.:
11/490925
Inventors:
Eric M. Panning - Hillsboro OR, US
Michael Goldstein - Ridgefield CT, US
Ranju D. Venables - Fremont CA, US
Michael Goldstein - Ridgefield CT, US
Ranju D. Venables - Fremont CA, US
International Classification:
G01J 1/00
US Classification:
2504951
Abstract:
A reflective optical illumination collector is described. In one example, the collector has a ring to collect light from a light source within a range of incident angles and to reflect the light off an inner surface of the ring to a target image of the collector. A plurality of rings concentric to the first ring may also be used. Each ring collects light from the light source within a range of incident angles and reflects the light off an inner surface of the respective ring to the target image of the collector.
Adjustment Of Distance Between Source Plasma And Mirrors To Change Partial Coherence
Adjustment Of Distance Between Source Plasma And Mirrors To Change Partial Coherence
US Patent:
7208747, Apr 24, 2007
Filed:
May 12, 2006
Appl. No.:
11/433412
Inventors:
Manish Chandhok - Beaverton OR, US
Eric M. Panning - Hillsboro OR, US
Bryan J. Rice - Hillsboro OR, US
Eric M. Panning - Hillsboro OR, US
Bryan J. Rice - Hillsboro OR, US
Assignee:
Intel Corporation - Santa Clara CA
International Classification:
G01B 9/02
US Classification:
2504922, 250504 R
Abstract:
According to an embodiment of the invention, an adjustable EUV light source may be used for photolithography. The EUV light source, such as an electrode, is mounted in an adjustable housing. The housing can be adjusted to change the distance between the light source and focusing mirrors, which in turn changes the partial coherence value of the system. The partial coherence value can be changed to print different types of semiconductor features.
Euv Energy Detection
Euv Energy Detection
US Patent:
7154101, Dec 26, 2006
Filed:
Mar 31, 2003
Appl. No.:
10/403961
Inventors:
Eric Panning - Hillsboro OR, US
Assignee:
Intel Corporation - Santa Clara CA
International Classification:
G01J 1/42
US Classification:
250372, 2503361
Abstract:
A detector for extreme ultraviolet (EUV) energy uses incidence reflectance of the EUV beam off the detector to both capture a small but controllable fraction of the EUV energy and to redirect most of the energy to its target. In one embodiment, a reflective coating of material on a sensor surface is used. In another embodiment, a multi-layer reflector on a sensor is used. A method of making the multi-layer reflector/sensor is also described.
Extreme Ultraviolet Illumination Source
Extreme Ultraviolet Illumination Source
US Patent:
7109504, Sep 19, 2006
Filed:
Jun 30, 2004
Appl. No.:
10/882784
Inventors:
Manish Chandhok - Beaverton OR, US
Eric Panning - Hillsboro OR, US
Bryan J. Rice - Hillsboro OR, US
Eric Panning - Hillsboro OR, US
Bryan J. Rice - Hillsboro OR, US
Assignee:
Intel Corporation - Santa Clara CA
International Classification:
H01J 35/00
US Classification:
250504R, 250251, 378119, 378121, 31511181, 31511191, 2041582
Abstract:
According to a first embodiment of the invention, a dual cathode electrode for generating EUV light is disclosed. The dual cathode electrode may include a first outer cathode, a second inner cathode, and an anode disposed between the inner and outer cathodes. The dual cathode electrode also includes a plasma disposed in between the cathodes that emits EUV photons when it is excited by an arc between the anode and the cathodes. According to a second embodiment of the invention, several Dense Plasma Focus (DPF) electrodes are placed along a circle. The DPF electrodes, when activated, will emit electron photons from the circle in which they are placed thereby avoiding obscuration used to protect UV mirrors against debris.
Adjustable Illumination Source
Adjustable Illumination Source
US Patent:
7098466, Aug 29, 2006
Filed:
Jun 30, 2004
Appl. No.:
10/883297
Inventors:
Manish Chandhok - Beaverton OR, US
Eric M. Panning - Hillsboro OR, US
Bryan J. Rice - Hillsboro OR, US
Eric M. Panning - Hillsboro OR, US
Bryan J. Rice - Hillsboro OR, US
Assignee:
Intel Corporation - Santa Clara CA
International Classification:
G01B 9/02
US Classification:
2504922, 250504 R
Abstract:
According to an embodiment of the invention, an adjustable EUV light source may be used for photolithography. The EUV light source, such as an electrode, is mounted in an adjustable housing. The housing can be adjusted to change the distance between the light source and focusing mirrors, which in turn changes the partial coherence value of the system. The partial coherence value can be changed to print different types of semiconductor features.