Eric David Miller
Nursing at Stetson Hl Blvd, Colorado Springs, CO
License number
Colorado 173730
Issued Date
Sep 30, 2005
Renew Date
Oct 1, 2015
Expiration Date
Sep 30, 2017
Type
Registered Nurse
Address
Address
6050 Stetson Hills Blvd APT 328, Colorado Springs, CO 80923
Professional information
Eric Miller
Location:
Colorado Springs, Colorado
Industry:
Information Technology and Services
Method Of Forming Shallow Trench Isolation In A Silicon Wafer
US Patent:
6537895, Mar 25, 2003
Filed:
Nov 14, 2000
Appl. No.:
09/713513
Inventors:
Eric R. Miller - Colorado Springs CO
Stephen R. Moon - Colorado Springs CO
Stephen R. Moon - Colorado Springs CO
Assignee:
Atmel Corporation - San Jose CA
International Classification:
H01L 2176
US Classification:
438427, 438438, 438700, 438973, 257521
Abstract:
A method of forming a shallow trench isolation region in a silicon wafer which results in the elimination of long range slip dislocations in the wafer and reduces leakage current across the isolation regions. Long shallow trenches are formed in a silicon wafer at a 45 degree angle to the ( ) plane of the wafer. This is achieved by moving the primary flat of the wafer to the ( ) plane prior to the formation of the trenches, which causes the bottom edges of the long trenches to intersect with several ( ) planes, so that stresses do not propagate along any one single ( ) plane. The trenches are then filled with an insulative material, such as oxide.