EMILY KATHERINE REDMAN
Medical Practice in Webster, NY
License number
Pennsylvania MT210410
Category
Medicine
Type
Graduate Medical Trainee
Address
Address
2
Webster, NY 14580
Pennsylvania
Pennsylvania
Personal information
See more information about EMILY KATHERINE REDMAN at radaris.comName
Address
Phone
303 W State St, Doylestown, PA 18901
1370 Viking Cir, Webster, NY 14580
45 Parchment Dr, New Hope, PA 18938
303 W State St, Doylestown, PA 18901
303 State St, Doylestown, PA 18901
Professional information
Protective Photoreceptor Outer Layer
US Patent:
2011018, Jul 28, 2011
Filed:
Jan 25, 2010
Appl. No.:
12/693354
Inventors:
Liang-Bih Lin - Rochester NY, US
Emily K. Redman - Webster NY, US
Brian P. Gilmartin - Williamsville NY, US
Emily K. Redman - Webster NY, US
Brian P. Gilmartin - Williamsville NY, US
Assignee:
XEROX CORPORATION - Norwalk CT
International Classification:
G03G 15/00, G02F 1/361, B32B 27/32
US Classification:
430 56, 399159, 252582, 428220
Abstract:
Embodiments pertain to a novel imaging member, namely, an imaging member or photoreceptor comprising a protective outer layer which comprises light-absorbing composition that substantially prevents any light absorption by the overcoat layer. The composition comprises a low strength thermal plastic resin and a high optical density yellow dye. Thus, the light-blocking protective layer reduces the intrinsic light shock suffered by conventional overcoat layers without negatively impacting electrical properties of the overcoat layer and while improving print quality.
Polyalkylene Glycol Benzoate Containing Photoconductors
US Patent:
7993805, Aug 9, 2011
Filed:
Dec 22, 2009
Appl. No.:
12/644071
Inventors:
Jin Wu - Pittsford NY, US
Sherri A Toates - Webster NY, US
John J Wilbert - Macedon NY, US
Emily K Redman - Webster NY, US
Sherri A Toates - Webster NY, US
John J Wilbert - Macedon NY, US
Emily K Redman - Webster NY, US
Assignee:
Xerox Corporation - Norwalk CT
International Classification:
G03G 5/047
US Classification:
430 588, 430 5875, 430 5805, 430 60
Abstract:
A photoconductor that includes a supporting substrate, an optional ground plane layer, an optional hole blocking layer, a photogenerating layer, and at least one charge transport layer, and where the charge transport layer contains a polyalkylene glycol benzoate.
Polyester-Based Photoreceptor Overcoat Layer
US Patent:
8257893, Sep 4, 2012
Filed:
Sep 28, 2009
Appl. No.:
12/568548
Inventors:
Liang-Bih Lin - Rochester NY, US
Brian P. Gilmartin - Williamsville NY, US
Emily K. Redman - Webster NY, US
Marc J. LiVecchi - Rochester NY, US
Brian P. Gilmartin - Williamsville NY, US
Emily K. Redman - Webster NY, US
Marc J. LiVecchi - Rochester NY, US
Assignee:
Xerox Corporation - Norwalk CT
International Classification:
G03G 5/00
US Classification:
430 66, 430 5835, 430 596
Abstract:
The presently disclosed embodiments are directed generally to an improved electrostatographic imaging member in which the overcoat layer comprises cross-linkable polyester resins. The overcoat layer not only provides wear resistance, but it also provides higher charge transport efficiency and therefore better photoelectrical properties. In addition, the polyesters can cross-link with a variety of resins and thus provide good adhesion as well.
Sulfonamide Phenolic Hole Blocking Photoconductor
US Patent:
7947418, May 24, 2011
Filed:
Dec 22, 2009
Appl. No.:
12/644099
Inventors:
Jin Wu - Pittsford NY, US
Marc J Livecchi - Rochester NY, US
Robert W Hedrick - Spencerport NY, US
Emily K Redman - Webster NY, US
Marc J Livecchi - Rochester NY, US
Robert W Hedrick - Spencerport NY, US
Emily K Redman - Webster NY, US
Assignee:
Xerox Corporation - Norwalk CT
International Classification:
G03G 5/14
US Classification:
430 65, 430 571, 430 60, 430 64
Abstract:
A photoconductor that includes, for example, a substrate, an undercoat layer thereover wherein the undercoat layer contains a metal oxide dispersed in a mixture of a sulfonamide formaldehyde resin and a phenolic formaldehyde resin; a photogenerating layer, and at least one charge transport layer.