DR. ELIZABETH S. STONE, PH.D.
Psychologist at Summer St, Stamford, CT
License number
Connecticut 00848
Category
Psychologist
Type
Psychologist
Address
Address
999 Summer St SUITE 200, Stamford, CT 06905
Phone
(203) 329-2928
(203) 322-0811
(203) 322-0811
Professional information
Dr. Elizabeth S Stone, Stamford CT - PHD
Specialties:
Psychology
Address:
999 Summer St STE 200, Stamford 06905
(203) 329-2928 (Phone)
(203) 329-2928 (Phone)
Languages:
English
De-Focus Uniformity Correction
US Patent:
2006013, Jun 29, 2006
Filed:
Dec 28, 2004
Appl. No.:
11/022888
Inventors:
Roberto Wiener - Bethel CT, US
Alexander Kremer - Stamford CT, US
Elizabeth Stone - Stamford CT, US
Richard Zimmerman - Brookfield CT, US
Alexander Kremer - Stamford CT, US
Elizabeth Stone - Stamford CT, US
Richard Zimmerman - Brookfield CT, US
Assignee:
ASML Holding N.V. - Veldhoven
International Classification:
G03B 27/54
US Classification:
355069000, 355077000
Abstract:
A system and method for uniformity correction such that a defined uniformity specification is met while minimizing a set of selected constraints is provided. The system includes illumination optics, an opto-mechanical correction system, a contrast device, projection optics and a correction module coupled to the correction system. The correction system includes a plurality of adjustable components such as fingers. The correction module is configured to determine adjustments to the components to correct uniformity. A method for discretizing the continuous intensity integral is also provided. The illumination slot is divided into a grid having multiple grid points. “pupils” are then superimposed onto the grid. Multiple second grids are also defined. Each ““pupil”” is mapped to a second grid such that the center of the second grid is coincident with the ““pupil”” center. The continuous intensity integral is then discretized using the first grid, plurality of second grids, and ““pupil”” mappings.
Lithographic Apparatus And Method For Illumination Uniformity Correction And Uniformity Drift Compensation
US Patent:
8629973, Jan 14, 2014
Filed:
May 28, 2010
Appl. No.:
12/789795
Inventors:
Richard Carl Zimmerman - Brookfield CT, US
Hendrikus Robertus Marie Van Greevenbroek - Eindhoven, NL
Peter C. Kochersperger - Easton CT, US
Todd R. Downey - Monroe CT, US
Elizabeth Stone - Stamford CT, US
Szilard Istvan Csiszar - Veldhoven, NL
Frederick Kubick - Redding CT, US
Olga Vladimirsky - Weston CT, US
Hendrikus Robertus Marie Van Greevenbroek - Eindhoven, NL
Peter C. Kochersperger - Easton CT, US
Todd R. Downey - Monroe CT, US
Elizabeth Stone - Stamford CT, US
Szilard Istvan Csiszar - Veldhoven, NL
Frederick Kubick - Redding CT, US
Olga Vladimirsky - Weston CT, US
Assignee:
ASML Holding N.V. - Veldhoven
ASML Netherlands B.V. - Veldhoven
ASML Netherlands B.V. - Veldhoven
International Classification:
G03B 27/54, G03B 27/58, G03F 7/20
US Classification:
355 71, 355 67
Abstract:
A lithographic apparatus including a uniformity correction system is disclosed. Fingers move into and out of intersection with a radiation beam to correct an intensity of the radiation beam. Actuating devices are coupled to the fingers. A width of a tip of each of the fingers is half that of a width of the actuating devices. Systems and methods compensate for uniformity drift. An illumination slit uniformity caused by system drift is measured. First positions of uniformity compensators are determined based on the uniformity. Uniformity compensators are moved to the first respective positions. A substrate is exposed.
De-Focus Uniformity Correction
US Patent:
7333176, Feb 19, 2008
Filed:
Dec 29, 2006
Appl. No.:
11/647419
Inventors:
Roberto B. Wiener - Bethel CT, US
Alexander Kremer - Stamford CT, US
Elizabeth Stone - Stamford CT, US
Richard Zimmerman - Brookfield CT, US
Alexander Kremer - Stamford CT, US
Elizabeth Stone - Stamford CT, US
Richard Zimmerman - Brookfield CT, US
Assignee:
ASML Holding N.V. - Veldhoven
International Classification:
G03B 27/52, G03B 27/42, G03B 27/72
US Classification:
355 55, 355 53, 355 69
Abstract:
A system and method for uniformity correction such that a defined uniformity specification is met while minimizing a set of selected constraints is provided. The system includes illumination optics, an opto-mechanical correction system, a contrast device, projection optics and a correction module coupled to the correction system. The correction system includes a plurality of adjustable components such as fingers. The correction module is configured to determine adjustments to the components to correct uniformity. A method for discretizing the continuous intensity integral is also provided. The illumination slot is divided into a grid having multiple grid points. “pupils” are then superimposed onto the grid. Multiple second grids are also defined. Each ““pupil”” is mapped to a second grid such that the center of the second grid is coincident with the ““pupil”” center.