EGBERT GUNTHER WOELK
Pilots at Keyes Way, North Andover, MA

License number
Massachusetts A4400471
Issued Date
Oct 2016
Expiration Date
Oct 2018
Category
Airmen
Type
Authorized Aircraft Instructor
Address
Address
50 Keyes Way, North Andover, MA 01845

Professional information

Egbert Woelk Photo 1

Vapor Delivery Device, Methods Of Manufacture And Methods Of Use Thereof

US Patent:
2014002, Jan 23, 2014
Filed:
Jul 18, 2012
Appl. No.:
13/552054
Inventors:
Egbert Woelk - North Andover MA, US
Assignee:
ROHM AND HAAS ELECTRONIC MATERIALS LLC - Marlborough MA
International Classification:
G05D 7/00, F17D 1/00
US Classification:
137 1, 422110
Abstract:
A method comprises transporting a first stream of a carrier gas to a delivery device that contains a liquid precursor compound. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream after emanating from the delivery device and the second stream are combined to form a third stream, such that the dew point of the vapor of the liquid precursor compound in the third stream is lower than the temperature of the plumbing that transports the vapor to a CVD reactor or a plurality of CVD reactors. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.


Egbert Woelk Photo 2

Organometallic Composition

US Patent:
2007015, Jul 5, 2007
Filed:
Dec 22, 2005
Appl. No.:
11/316466
Inventors:
Deodatta Vinayak Shenai-Khatkhate - Danvers MA, US
Egbert Woelk - North Andover MA, US
Assignee:
Rohm and Haas Electronic Materials LLC - Marlborough MA
International Classification:
C23C 16/00
US Classification:
4272481, 118715
Abstract:
Compositions including germanium compounds suitable for use as vapor phase deposition precursors for germanium-containing films are provided. Methods of depositing films containing germanium using such compositions are also provided. Such germanium-containing films are particularly useful in the manufacture of electronic devices.


Egbert Woelk Photo 3

Delivery Device And Method Of Use Thereof

US Patent:
2012003, Feb 9, 2012
Filed:
Aug 9, 2010
Appl. No.:
12/853052
Inventors:
Egbert Woelk - North Andover MA, US
Assignee:
ROHM AND HAAS ELECTRONIC MATERIALS LLC - Marlborough MA
International Classification:
C23C 16/455, C23C 16/00
US Classification:
4272481, 118726
Abstract:
A delivery device comprises an inlet port and an outlet port. The delivery device comprises an inlet chamber and an outlet chamber, with the outlet chamber being opposedly disposed to the inlet chamber and in fluid communication with the inlet chamber via a conical section. The outlet chamber comprises a labyrinth that is operative to prevent solid particles of a solid precursor compound contained in the delivery device from leaving the delivery device while at the same time permitting vapors of the solid precursor compound to leave the delivery device via the outlet port.


Egbert Woelk Photo 4

Vapor Delivery Device, Methods Of Manufacture And Methods Of Use Thereof

US Patent:
2012029, Nov 29, 2012
Filed:
May 24, 2011
Appl. No.:
13/114794
Inventors:
Egbert Woelk - North Andover MA, US
Assignee:
ROHM AND HAAS ELECTRONIC MATERIALS LLC - Marlborough MA
International Classification:
C23C 16/00
US Classification:
118726, 4272481
Abstract:
A method comprises transporting a first stream of a carrier gas to a delivery device that contains a solid precursor compound. The first stream of carrier gas is at a temperature greater than or equal to 20° C. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream and the second stream are combined to form a third stream, such that the dewpoint of the vapor of the solid precursor compound in the third stream is lower than the ambient temperature. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.


Egbert Woelk Photo 5

Vapor Delivery Device, Methods Of Manufacture And Methods Of Use Thereof

US Patent:
2012029, Nov 29, 2012
Filed:
May 24, 2011
Appl. No.:
13/114781
Inventors:
Egbert Woelk - North Andover MA, US
Assignee:
ROHM AND HAAS ELECTRONIC MATERIALS LLC - Marlborough MA
International Classification:
G05D 11/00
US Classification:
137 2, 137 93
Abstract:
A method comprises transporting a first stream of a carrier gas to a delivery device that contains a solid precursor compound. The first stream of carrier gas is at a temperature greater than or equal to 20° C. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream and the second stream are combined to form a third stream, such that the dewpoint of the vapor of the solid precursor compound in the third stream is lower than the ambient temperature. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.


Egbert Woelk Photo 6

Germanium Compound Delivery Device

US Patent:
2007007, Apr 5, 2007
Filed:
Nov 27, 2006
Appl. No.:
11/604475
Inventors:
Egbert Woelk - North Andover MA, US
Deodatta Shenai-Khatkhate - Danvers MA, US
Assignee:
Rohm and Haas Electronic Materials LLC - Marlborough MA
International Classification:
C23C 16/00
US Classification:
438478000, 118715000
Abstract:
Germanium compounds suitable for use as vapor phase deposition precursors for germanium films are provided. Methods of depositing films containing germanium using such compounds are also provided. Such germanium films are particularly useful in the manufacture of electronic devices.


Egbert Woelk Photo 7

Organometallic Compounds

US Patent:
7390360, Jun 24, 2008
Filed:
Sep 28, 2005
Appl. No.:
11/237999
Inventors:
Deodatta Vinayak Shenai-Khatkhate - Danvers MA, US
Egbert Woelk - North Andover MA, US
Assignee:
Rohm and Haas Electronic Materials LLC - Marlborough MA
International Classification:
C30B 25/00
US Classification:
117 84, 438481
Abstract:
Compositions useful in the manufacture of compound semiconductors are provided. Methods of manufacturing compound semiconductors using these compositions are also provided.


Egbert Woelk Photo 8

Method And Apparatus

US Patent:
8501266, Aug 6, 2013
Filed:
Mar 29, 2010
Appl. No.:
12/749048
Inventors:
Egbert Woelk - North Andover MA, US
Assignee:
Rohm and Haas Electronics Materials LLC - Marlborough MA
International Classification:
C23C 16/52
US Classification:
427 8, 4272481, 42725528, 42725534
Abstract:
Disclosed is a method of providing a constant concentration of a metal-containing precursor compound in the vapor phase in a carrier gas. Such method is particularly useful in supplying a constant concentration of a gaseous metal-containing compound to a plurality of vapor deposition reactors.


Egbert Woelk Photo 9

Delivery Device

US Patent:
2010030, Dec 2, 2010
Filed:
May 25, 2010
Appl. No.:
12/786639
Inventors:
Deodatta Vinayak SHENAI-KHATKHATE - Danvers MA, US
Michael L. Timmons - Durham NC, US
Charles J. Marsman - Wilbraham MA, US
Egbert Woelk - North Andover MA, US
Assignee:
Rohm and Haas Electronic Materials LLC - Marlborough MA
International Classification:
C23C 16/448
US Classification:
118726
Abstract:
Delivery devices for delivering solid precursor compounds in the vapor phase to reactors are provided. Such devices include a precursor composition of a solid precursor compound with a layer of packing material disposed thereon. Also provided are methods for transporting a carrier gas saturated with the precursor compound for delivery into such CVD reactors.


Egbert Woelk Photo 10

Delivery Device

US Patent:
7722720, May 25, 2010
Filed:
Dec 6, 2005
Appl. No.:
11/295381
Inventors:
Deodatta Vinayak Shenai-Khatkhate - Danvers MA, US
Michael L. Timmons - Durham NC, US
Charles J. Marsman - Wilbraham MA, US
Egbert Woelk - North Andover MA, US
Assignee:
Rohm and Haas Electronic Materials LLC - Marlborough MA
International Classification:
C23C 16/00, B01J 27/132
US Classification:
118726, 118715, 42725528, 502224
Abstract:
Delivery devices for delivering solid precursor compounds in the vapor phase to reactors are provided. Such devices include a precursor composition of a solid precursor compound with a layer of packing material disposed thereon. Also provided are methods for transporting a carrier gas saturated with the precursor compound for delivery into such CVD reactors.