MR. DOUGLAS CUTLER SCOTT CUTLER, M.A., CCC-SLP
Speech Language Pathology at Country Club Dr, Mesa, AZ
License number
Arizona AZ0903
Category
Speech Language Pathology
Type
Speech-Language Pathologist
Address
Address
2
1025 N Country Club Dr, Mesa, AZ 85201
1779 E Erie St, Gilbert, AZ 85296
1779 E Erie St, Gilbert, AZ 85296
Phone
(480) 472-0727
(480) 963-6805
(480) 963-6805
Personal information
See more information about DOUGLAS CUTLER SCOTT CUTLER at radaris.comName
Address
Phone
514 W Rio Salado Pkwy, Mesa, AZ 85201
5956 E Sun County Blvd, Tucson, AZ 85712
233 Val Vista Dr, Mesa, AZ 85213
Professional information
See more information about DOUGLAS CUTLER SCOTT CUTLER at trustoria.com
Method For Reducing The Formation Of Contaminants During Supercritical Carbon Dioxide Processes
Method For Reducing The Formation Of Contaminants During Supercritical Carbon Dioxide Processes
US Patent:
2004001, Jan 29, 2004
Filed:
Jan 24, 2003
Appl. No.:
10/351214
Inventors:
Ronald Bertram - Gilbert AZ, US
William Jones - Phoenix AZ, US
Douglas Scott - Gilbert AZ, US
William Jones - Phoenix AZ, US
Douglas Scott - Gilbert AZ, US
International Classification:
B08B003/00
US Classification:
134/026000, 134/030000, 134/036000, 134/095100, 134/103100, 134/108000, 134/111000
Abstract:
A method and system for reliably reducing the formation of particles upon wafers or substrates during wafer processes is disclosed. The method and system reduces residue contamination of a substrate material during wafer processes by pre-filling a pressure chamber to a first pressure Pwith a purified pre-fill prior to filling the pressure chamber with a primary bulk source at a second pressure P. By pre-filling a chamber with purified pre-fill source at the first pressure Pwhich is substantially equal to the bulk source pressure P, the contaminants found in the bulk COremain within the bulk CO. Thus, this method and system reduces precipitation of contaminates caused by the depressurization of the bulk source during wafer processes and thereby reduces corresponding substrate material contamination.
Method And Apparatus For Selectively Filtering Residue From A Processing Chamber
Method And Apparatus For Selectively Filtering Residue From A Processing Chamber
US Patent:
2006010, May 18, 2006
Filed:
Nov 15, 2004
Appl. No.:
10/990162
Inventors:
Douglas Scott - Gilbert AZ, US
International Classification:
C23F 1/00
US Classification:
156345180, 216093000
Abstract:
The processing system comprises a pump assembly, a bypass assembly, and a processing chamber, which together form a circulation path. The bypass assembly is configured so that in a first mode, a filter does not form part of the circulation path, and in a second mode the filter does form part of the circulation path. Thus, the processing system is placed in the first mode when a processing material circulated over the circulation path does not need to be filtered. The processing system is placed in the second mode when a processing material circulated over the circulation path must be filtered.
Removal Of Contaminants From A Fluid
Removal Of Contaminants From A Fluid
US Patent:
7550075, Jun 23, 2009
Filed:
Mar 23, 2005
Appl. No.:
11/088339
Inventors:
Ronald Thomas Bertram - Gilbert AZ, US
Douglas Michael Scott - Gilbert AZ, US
Douglas Michael Scott - Gilbert AZ, US
Assignee:
Tokyo Electron Ltd.
International Classification:
B01D 35/14
US Classification:
210 961, 210134, 210143, 210254, 96397
Abstract:
A method and apparatus for removing contaminants from a fluid are disclosed. The fluid is introduced into a decontamination chamber such that the fluid is cooled and contaminants fall out within the decontamination chamber, producing a purified fluid. The purified fluid is then retrieved and can be used in a supercritical processing system.