Dean Face
Electrician in Wilmington, DE
License number
Delaware TH-0003910
Issued Date
Dec 19, 2007
Expiration Date
Dec 19, 2008
Category
Electrical Examiners
Type
Homeowner's Permit
Address
Address
2
Wilmington, DE 19803
Personal information
See more information about Dean Face at radaris.comName
Address
Phone
208 Country Club Dr, Wilmington, DE 19803
Wilmington, DE
208 Country Club Dr, Wilmington, DE 19803
319 Sharpley Rd, Wilmington, DE 19803
710 Ashford Rd, Wilmington, DE 19803
Professional information
See more information about Dean Face at trustoria.com
Cryogenic Devices
Cryogenic Devices
US Patent:
6711912, Mar 30, 2004
Filed:
Jul 2, 2002
Appl. No.:
10/187548
Inventors:
Daniel B. Laubacher - Wilmington DE
Zhi-Yuan Shen - Wilmington DE
Philip Shek Wah Pang - Media PA
Alan Lauder - Kennett Square PA
Dean Face - Wilmington DE
Zhi-Yuan Shen - Wilmington DE
Philip Shek Wah Pang - Media PA
Alan Lauder - Kennett Square PA
Dean Face - Wilmington DE
Assignee:
E. I. du Pont de Nemours and Company - Wilmington DE
International Classification:
F25D 2312
US Classification:
622592
Abstract:
This invention relates generally to cryogenic devices and, more particularly, to cryogenic devices of very small size based on superconducting elements, low thermal transmission interconnects and low dissipated power semiconductor.
Thin Film Dielectrics With Co-Fired Electrodes For Capacitors And Methods Of Making Thereof
Thin Film Dielectrics With Co-Fired Electrodes For Capacitors And Methods Of Making Thereof
US Patent:
2008001, Jan 17, 2008
Filed:
Jul 14, 2006
Appl. No.:
11/486837
Inventors:
William J. Borland - Cary NC, US
Patrick Daniels - Cary NC, US
Dean W. Face - Wilmington DE, US
Jon Fredrick Ihlefeld - Raleigh NC, US
Jon-Paul Maria - Raleigh NC, US
Patrick Daniels - Cary NC, US
Dean W. Face - Wilmington DE, US
Jon Fredrick Ihlefeld - Raleigh NC, US
Jon-Paul Maria - Raleigh NC, US
International Classification:
H01G 7/00, H01G 4/06, H01L 21/20, H05K 3/10
US Classification:
29 2542, 29846, 361311, 438381
Abstract:
Methods of making capacitors are disclosed that comprise forming a dielectric layer over a substrate with a first electrode or a bare metallic foil, depositing a top conductive layer over the dielectric layer, and annealing the dielectric layer and the top conductive layer wherein the foil or first electrode, the dielectric, and the conductive layer form a capacitor.
Process For Producing Thin Films Of Inorganic Oxides Of Controlled Stoichiometry
Process For Producing Thin Films Of Inorganic Oxides Of Controlled Stoichiometry
US Patent:
5389606, Feb 14, 1995
Filed:
Nov 12, 1993
Appl. No.:
8/151236
Inventors:
Dean W. Face - Wilmington DE
Assignee:
E. I. du Pont de Nemours and Company - Wilmington DE
International Classification:
C23C 1400, B05D 512
US Classification:
505473
Abstract:
An in-situ process for preparing thin films which contain relatively volatile and involatile oxides is disclosed, in particular, crystalline thin films of oxides of conductors, superconductors or ferroelectric materials, wherein separate sources of the relatively volatile and involatile oxides during depositon of the thin film are employed.
High Flow Gas Manifold For High Rate, Off-Axis Sputter Deposition
High Flow Gas Manifold For High Rate, Off-Axis Sputter Deposition
US Patent:
5667650, Sep 16, 1997
Filed:
Feb 14, 1995
Appl. No.:
8/389704
Inventors:
Dean Willett Face - Wilmington DE
Kirsten Elizabeth Myers - Philadelphia PA
Kirsten Elizabeth Myers - Philadelphia PA
Assignee:
E. I. Du Pont de Nemours and Company - Wilmington DE
International Classification:
C23C 1434
US Classification:
20429807
Abstract:
An improved device for off-axis magnetron sputter deposition of inorganic oxide compounds having a sputter gun, target, substrate, gas flow means and enclosure chamber wherein the improvement comprises a hollow gas flow manifold positioned between the substrate and the target having at least one gas inlet and at least one outlet opening on the manifold, said outlet opening positioned to direct the gas flow away from the target and in the direction of the substrate, and a process for such deposition are disclosed.
Process Of Forming Multilayered Tl-Containing Superconducting Composites
Process Of Forming Multilayered Tl-Containing Superconducting Composites
US Patent:
5567673, Oct 22, 1996
Filed:
Mar 29, 1995
Appl. No.:
8/412424
Inventors:
Dean W. Face - Wilmington DE
Kirsten E. Myers - Philadelphia PA
Kirsten E. Myers - Philadelphia PA
Assignee:
E. I. Du Pont de Nemours and Company - Wilmington DE
International Classification:
H01L 3924
US Classification:
505329
Abstract:
This invention relates to a process of forming multilayered thallium-containing superconducting composites, wherein a first thallium-containing superconducting layer, an intermediate thallium-containing oxide layer and a second thallium-containing superconducting layer are successively deposited on a substrate by a vapor phase process by controlling the heating temperature, pressure of oxidizing gas and thallium vapor pressure during post-deposition annealing of the superconducting films.
Process For Depositing High Temperature Superconducting Oxide Thin Films
Process For Depositing High Temperature Superconducting Oxide Thin Films
US Patent:
5439877, Aug 8, 1995
Filed:
Mar 24, 1994
Appl. No.:
8/217036
Inventors:
Dean W. Face - Wilmington DE
Assignee:
E. I. Du Pont de Nemours and Company - Wilmington DE
International Classification:
C23C 1434
US Classification:
505475
Abstract:
In-situ process are provided for 1) depositing on a substrate a crystalline thin film of a high temperature superconducting oxide by exposing the back surface of the substrate, i. e. , the surface of the substrate opposite the surface on which the thin film is deposited, to radiation from a direct radiant heat source, thereby heating the substrate to the desired growth temperature, and maintaining the radiation and thereby the desired growth temperature during the deposition of the thin film, and 2) depositing a crystalline thin film of high temperature superconducting oxides onto both the front and back surfaces of a substrate.
Process For Making High Temperature Superconductor Devices Each Having A Line Oriented In A Spiral Fashion
Process For Making High Temperature Superconductor Devices Each Having A Line Oriented In A Spiral Fashion
US Patent:
7295085, Nov 13, 2007
Filed:
Aug 2, 2004
Appl. No.:
10/909696
Inventors:
Dean W. Face - Wilmington DE, US
Assignee:
E.I. du Pont de Nemours and Company - Wilmington DE
International Classification:
H01P 1/203, H01P 1/20
US Classification:
333 99S, 333185, 333204, 505210, 505238
Abstract:
A process for producing high temperature superconductor (HTS) mini-filters or coils in which the high temperature superconductor films are deposited on a layer of CeOon a substrate results in higher yields of mini-filters or coils.
Multilayered Composites And Process Of Manufacture
Multilayered Composites And Process Of Manufacture
US Patent:
5736488, Apr 7, 1998
Filed:
Jan 26, 1996
Appl. No.:
8/592242
Inventors:
Dean Willett Face - Wilmington DE
Kirsten Elizabeth Myers - Philadelphia PA
Kirsten Elizabeth Myers - Philadelphia PA
Assignee:
E. I. du Pont de Nemours and Company - Wilmington DE
International Classification:
H01L 3922
US Classification:
505238
Abstract:
This invention relates to multilayered superconductive composites, particularly to composites based on thallium-containing superconducting oxides, and their process of manufacture.