DR. DAVID LEVY, D.M.D.
Dentist at Hudson Ave, Rochester, NY

6007976, Dec 28, 1999

Jan 21, 1998

9/010055

David H. Levy - Rochester NY
John Gasper - Hilton NY

Eastman Kodak Company - Rochester NY

G03C 1735

430559

A silver halide imaging element is disclosed that is capable of providing a sharp image with silver halide grains still present following imagewise exposure and development. This is achieved by choosing a dispersing medium for the silver halide grains comprised of an organic vehicle and, dispersed therein, titanium dioxide particles having an average size of less than 0. 1 micrometer accounting for at least 10 percent by weight of the dispersing medium. The elements are useful for optical printing or scan image retrieval without fixing. The elements can be used for providing black-and-white photographic images, radiographic images or dye images.

2008030, Dec 11, 2008

Jun 4, 2007

11/757578

Lyn M. Irving - Rochester NY, US
David H. Levy - Rochester NY, US
Andrea C. Childs - Webster NY, US

H01L 33/00, H01L 21/336

257 88, 438 22, 257E33001, 257E21411

A method of making a thin film transistor comprising a thin film semiconductor element comprised of a transparent zinc-oxide-based semiconductor material, wherein spaced apart first and second contacts in contact with said material are positioned on either side of a channel in the thin film semiconductor element such that the elongated sides of the channel are aligned with an underlying gate structure. The method can be accomplished while maintaining the substrate temperature at no more than 300° C. during fabrication.

2011009, Apr 28, 2011

Oct 27, 2009

12/606234

David H. Levy - Rochester NY, US
Roger S. Kerr - Brockport NY, US
Todd M. Spath - Hilton NY, US

C23C 16/00, B65G 53/40

4272481, 406155

A fluid conveyance system for thin film material deposition includes a first fluid distribution manifold and a second distribution manifold. The first fluid distribution manifold includes an output face that includes a plurality of elongated slots. The plurality of elongated slots includes a source slot and an exhaust slot. The second fluid distribution manifold includes an output face that includes a plurality of openings. The plurality of openings include a source opening and an exhaust opening. The second fluid distribution manifold is positioned spaced apart from and opposite the first fluid distribution manifold such that the source opening of the output face of the second fluid distribution manifold mirrors the source slot of the output face of the first fluid distribution manifold and the exhaust opening of the output face of the second fluid distribution manifold mirrors the exhaust slot of the output face of the first fluid distribution manifold.

2011009, Apr 28, 2011

Oct 27, 2009

12/606231

Roger S. Kerr - Brockport NY, US
David H. Levy - Rochester NY, US
James E. Sutton - Rochester NY, US

C23C 16/458, C23C 16/00

4272555, 118729, 137561 R

A fluid conveyance system for thin film material deposition includes a fluid distribution manifold and a substrate transport mechanism. The fluid distribution manifold includes an output face that includes a plurality of elongated slots. The output face of the fluid distribution manifold is positioned opposite a first surface of the substrate such that the elongated slots face the first surface of the substrate and are positioned proximate to the first surface of the substrate. The substrate transport mechanism causes a substrate to travel in a direction and includes a flexible mechanism that contacts a second surface of the substrate in a region that is proximate to the output face of the fluid distribution manifold.

2011012, May 26, 2011

Nov 20, 2009

12/622530

David H. Levy - Rochester NY, US

H01L 31/04, B05D 5/12, B32B 3/10, H05K 1/16

136256, 427 58, 4281951, 174260

A chemical vapor deposition method such as an atomic-layer-deposition method for forming a patterned thin film includes applying a deposition inhibitor material to a substrate. The deposition inhibitor material is a hydrophilic polymer that that has in its backbone, side chains, or both backbone and side chains, multiple hydrophilic groups that are represented by the following structure:The deposition inhibitor material is patterned simultaneously or subsequently to its application to the substrate, to provide selected areas of the substrate effectively not having the deposition inhibitor material. A thin film is substantially deposited only in the selected areas of the substrate not having the deposition inhibitor material.

2012018, Jul 19, 2012

Mar 2, 2012

13/410342

Lyn M. Irving - Rochester NY, US
David H. Levy - Rochester NY, US
Lan B. Thai - Penfield NY, US

H01L 33/62

257 88, 257E33062

A process for forming a pixel circuit is disclosed comprising: (a) providing a transparent support; (b) forming a multicolor mask having at least four different color patterns; (c) forming integrated electronic components of the pixel circuit having at least four layers of patterned functional material comprising a first conductor, a dielectric, a semiconductor, and a second conductor each layer of patterned functional material corresponding to the four different color patterns of the multicolor mask. The functional material is patterned using a photopattern corresponding to each color pattern.

8207063, Jun 26, 2012

Jan 26, 2007

11/627525

David H. Levy - Rochester NY, US
Shelby F. Nelson - Pittsford NY, US
Diane C. Freeman - Pittsford NY, US
Thomas D. Pawlik - Rochester NY, US

Eastman Kodak Company - Rochester NY

H01L 21/20

438680, 438149, 438150, 438151, 438152, 438153, 438154, 438765

The present invention relates to a process of making a zinc-oxide-based thin film semiconductor, for use in a transistor, comprising thin film deposition onto a substrate comprising providing a plurality of gaseous materials comprising at least first, second, and third gaseous materials, wherein the first gaseous material is a zinc-containing volatile material and the second gaseous material is reactive therewith such that when one of the first or second gaseous materials are on the surface of the substrate the other of the first or second gaseous materials will react to deposit a layer of material on the substrate and wherein the third gaseous material is inert with respect to reacting with the first or second gaseous materials.

2002000, Jan 24, 2002

May 14, 2001

09/855046

Richard Szajewski - Rochester NY, US
David Levy - Rochester NY, US

H04N001/387, G03C001/498, G03C001/42, H04N001/23, G06K015/02, G06K015/14, G06K015/12, H04N001/29, G06F015/00, G03C005/16

358/501000, 430/505000, 430/944000, 430/504000, 430/351000, 430/353000, 358/001100, 358/505000, 358/474000, 358/296000, 358/300000, 358/302000

The present invention is directed to a method of scanning silver-halide-containing color photographic and photothermographic film. In particular, the present invention comprises record shifting by means by employing at least one infrared dye in a color unit of the film, thereby forming at least one image record in the infrared. This expedient leads to the formation of high quality images, especially when scanning photothermographic elements in which the silver halide, metallic silver, and/or any organic silver salts have not been removed.

6306551, Oct 23, 2001

Dec 30, 1999

9/475691

Zbyslaw R. Owczarczyk - Webster NY
Xiqiang Yang - Webster NY
David H. Levy - Rochester NY
Mark E. Irving - Rochester NY

Eastman Kodak Company - Rochester NY

G03C 110, G03C 134, G03C 142, G03C 143, G03C 1498

430 21

This invention relates to an imaging element comprising an imaging layer having associated therewith a compound of Structure I: ##STR1## wherein the substituents are as defined in the specification.