DAVID DIXON
Electrician at Brentwood St, Austin, TX
License number
Texas 203691
Expiration Date
Oct 10, 2016
Category
Apprentice Electrician
Address
Address
1411 Brentwood St, Austin, TX 78757
Phone
(512) 917-0228
Professional information
Executive Director - Program Management At University Of Texas System
Position:
Executive Director - Program Management at University of Texas System
Location:
Austin, Texas Area
Industry:
Higher Education
Work:
University of Texas System
-
Executive Director - Program Management
Skills:
Management, Contract Management, Submittals, Public Speaking, Project Management, Business Analysis, Program Management, Customer Service, Construction Management, Fundraising, Higher Education, MS Project, Team Building, Contract Negotiation, PowerPoint, Research, Staff Development, Strategic Planning, Budgets, Leadership Development, Leadership, Architecture, Sustainability, Construction, Event Planning, Non-profits, Project Planning, Business Strategy, Financial Analysis, Microsoft Office
Executive Director Of Program Mgmt At Ut System Ofpc
Position:
Executive Director of Program Mgmt at UT System OFPC
Location:
Austin, Texas Area
Industry:
Higher Education
Work:
UT System OFPC
since Jul 2001
-
Executive Director of Program Mgmt
Method And System For Facilitating Preventive Maintenance Of An Optical Inspection Tool
US Patent:
7478014, Jan 13, 2009
Filed:
Sep 29, 2006
Appl. No.:
11/529352
Inventors:
David Dixon - Austin TX, US
Michael Kincaid - Kyle TX, US
Michael Kincaid - Kyle TX, US
Assignee:
Tokyo Electron Limited - Tokyo
International Classification:
G06F 19/00
US Classification:
702184
Abstract:
A method of determining preventive maintenance for an optical inspection system for inspecting photolithography processed substrates. The method includes measuring at least one operational characteristic of the optical inspection system and comparing a measurement result for said at least one operational characteristic with predetermined preventive maintenance criteria for the operational characteristic. Also included is determining a preventive maintenance requirement based on a comparison result of said comparing, and initiating a preventive maintenance action on said optical inspection system, said preventive maintenance action corresponding to said preventive maintenance requirement. A method of automatically performing preventive maintenance on an optical inspection system, and for retrofitting an optical inspection system to facilitate preventive maintenance of the optical inspection system are also disclosed.
Method And System To Compensate For Lamp Intensity Differences In A Photolithographic Inspection Tool
US Patent:
7359545, Apr 15, 2008
Filed:
Dec 31, 2003
Appl. No.:
10/749887
Inventors:
David Dixon - Austin TX, US
Lloyd Lee - Manchacha TX, US
Lloyd Lee - Manchacha TX, US
Assignee:
Tokyo Electron Limited - Tokyo
International Classification:
G06K 9/00
US Classification:
382145, 315293
Abstract:
An after develop inspection tool considers tool-to-tool variability when determining confidence score for wafers under inspection. A golden wafer is used to calculate a RGB signature as well as the slope of the individual RGB curves for different lamp intensities. These slopes are normalized in order to generate a compensation factor for red values and blue values within a signature. When a wafer is subsequently inspected at an ADI station using a different lamp, the test wafer RGB signature is likely captured at a different lamp intensity. Consequently, when comparing the signatures, the golden wafer RGB signature is adjusted by the compensation factors, based on the different lamp's intensity setting, and this adjusted RGB signature is then used to determine whether a defect exists on the test wafer.
Method And System To Compensate For Lamp Intensity Differences In A Photolithographic Inspection Tool
US Patent:
7680321, Mar 16, 2010
Filed:
Apr 11, 2008
Appl. No.:
12/101260
Inventors:
David Dixon - Austin TX, US
Lloyd Lee - Manchacha TX, US
Lloyd Lee - Manchacha TX, US
Assignee:
Tokyo Electron Limited - Tokyo
International Classification:
G06K 9/00
US Classification:
382145
Abstract:
An after develop inspection tool considers tool-to-tool variability when determining confidence score for wafers under inspection. A golden wafer is used to calculate a RGB signature as well as the slope of the individual RGB curves for different lamp intensities. These slopes are normalized in order to generate a compensation factor for red values and blue values within a signature. When a wafer is subsequently inspected at an ADI station using a different lamp, the test wafer RGB signature is likely captured at a different lamp intensity. Consequently, when comparing the signatures, the golden wafer RGB signature is adjusted by the compensation factors, based on the different lamp's intensity setting, and this adjusted RGB signature is then used to determine whether a defect exists on the test wafer.
Method And System For Monitoring Photolithography Processing Based On A Batch Change In Light Sensitive Material
US Patent:
7591600, Sep 22, 2009
Filed:
Feb 23, 2007
Appl. No.:
11/678410
Inventors:
David Dixon - Austin TX, US
Bryan Swain - Richmond VA, US
Bryan Swain - Richmond VA, US
Assignee:
Tokyo Electron Limited - Tokyo
International Classification:
G03D 5/00, B05C 11/00, G03F 1/00
US Classification:
396611, 396578, 118688, 118712, 430325
Abstract:
A method for monitoring photolithography processing includes monitoring application of a light sensitive material to the surface of each of a plurality of substrates and detecting that a supply of the light sensitive material applied to the substrates has changed from a first batch of light sensitive material to a second batch light sensitive material. A change in photolithography process results caused by the change from the first batch to the second batch of light sensitive material is determined. Also included is initiating corrective action based on the change in photolithography process results.
Multi-Pitch Scatterometry Targets
US Patent:
8024676, Sep 20, 2011
Filed:
Feb 13, 2009
Appl. No.:
12/371193
Inventors:
Michael A. Carcasi - Austin TX, US
David Dixon - Austin TX, US
David Dixon - Austin TX, US
Assignee:
Tokyo Electron Limited - Tokyo
International Classification:
G06F 17/50, G06F 19/00, G21K 5/00, G03F 1/00, H01L 21/00
US Classification:
716 54, 716 52, 716 55, 430 5, 378 35, 438 7, 438 16, 700108, 700121
Abstract:
The invention can provide a method of processing a substrate using multi-pitch scatterometry targets (M-PSTs) for de-convolving lithographic process parameters during Single-Patterning (S-P), Double-Patterning (D-P) procedures, and Double-Exposure (D-E) procedures used to control transistor structures. The M-PSTs) can have critical dimension (CD) and sidewall angle (SWA) sensitivity to exposure focus variations, exposure dose variations, and post exposure bake (PEB) temperature variations. In addition, the variation can be de-convolved so that the individual measurement process variable contributor can be identified.
David Dixon
Location:
Austin, Texas Area
Industry:
Renewables & Environment
Skills:
Renewable Energy, Photovoltaics, Metrology, Semiconductors, Engineering Management
Scatterometry Target For Determining Cd And Overlay
US Patent:
7449265, Nov 11, 2008
Filed:
Nov 20, 2007
Appl. No.:
11/943286
Inventors:
David Dixon - Austin TX, US
Assignee:
Tokyo Electron Limited
International Classification:
G03F 9/00
US Classification:
430 22, 257797, 356401, 430 5, 430 30
Abstract:
The invention can provide a method of processing a wafer using segmented multi-dimensional targets that can be used in Double-Patterning (D-P) procedures.