Inventors:
WILLIAM A. HATHCOCK - Red Hook NY, US
DAVID R. LEE - Danbury CT, US
International Classification:
C23C 16/455
Abstract:
Gas distribution apparatus for use in substrate processing chambers are disclosed. In some embodiments, gas distribution apparatus may include a faceplate to distribute a gas to a substrate. The faceplate includes a first side that faces the substrate. A central region of the first side has a first surface finish and a peripheral region of the first side has a second surface finish different than the first. A plurality of gas distribution holes are disposed through the faceplate to allow the gas to pass through the faceplate to a volume disposed on the first side of the faceplate. A rabbet may be disposed along an outer periphery of the faceplate on the first side with a ring disposed in the rabbet and removably coupled to the faceplate to form the peripheral region. The ring has a second side having the second surface finish that faces the substrate during use.