DANIEL SHU-ENG CHEN, M.D.
Osteopathic Medicine in Richardson, TX

License number
Texas E5355
Category
Osteopathic Medicine
Type
Anesthesiology
License number
Texas E5355
Category
Psychiatric
Type
Interventional Pain Medicine
License number
Texas E5355
Category
Osteopathic Medicine
Type
Pain Medicine
License number
Texas E5355
Category
Osteopathic Medicine
Type
Addiction Medicine
Address
Address
375 Municipal Dr Suite #240, Richardson, TX 75080
Phone
(972) 690-7246

Personal information

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Name
Address
Phone
Daniel Chen
4623 S Hampton St, Sugar Land, TX 77479
Daniel Chen
5370 Rollingbrook Ln, Beaumont, TX 77706
Daniel Chen
4605 Birkshire Ln, Plano, TX 75024
Daniel Chen
4014 Lakeside Dr, Rowlett, TX 75088
Daniel Chen
4043 Brenner Ct, Sugar Land, TX 77478

Professional information

Daniel S Chen Photo 1

Dr. Daniel S Chen, Richardson TX - MD (Doctor of Medicine)

Specialties:
Pain Medicine
Address:
Daniel Chen MD PA
375 Municipal Dr SUITE 240, Richardson 75080
(972) 690-7246 (Phone)
Languages:
English, Chinese
Hospitals:
Daniel Chen MD PA
375 Municipal Dr SUITE 240, Richardson 75080
Methodist Richardson Medical Center
401 West Campbell Rd, Richardson 75080
Education:
Medical School
Taipei Medical College
Graduated: 1973
Dallas Co Hp Parkland Mem
University Tx Sw Med Center Affil Hsps
Background:
Sanction:  1 time(s)
Board Actions:  2 time(s)


Daniel Shu-Eng Chen Photo 2

Daniel Shu-Eng Chen, Richardson TX

Specialties:
Anesthesiologist
Address:
375 Municipal Dr, Richardson, TX 75080


Daniel Chen Photo 3

Nmos Transistor Having Inversion Layer Source/Drain Contacts

US Patent:
4994869, Feb 19, 1991
Filed:
Jun 30, 1989
Appl. No.:
7/375169
Inventors:
Mishel Matloubian - Emeryville CA
Daniel C. Chen - Richardson TX
Assignee:
Texas Instruments Incorporated - Dallas TX
International Classification:
H01L 2910
US Classification:
357 233
Abstract:
A transistor (42) is provided having a gate conductor (44) formed adjacent a semiconductor substrate (46) and separated therefrom by a gate insulator (48). Sidewall spacers (52, 54) are formed at the sides of gate conductor (44) and adjacent semiconductor substrate (46). Diffused regions (56, 58) are formed within semiconductor substrate (46) in order to provide source/drain regions for transistor (42). Positive charges from radiation are trapped within sidewall spacers (52, 54) thereby attracting negative charges from semiconductor substrate (46) such that a negative charge layer is created between diffused region (56) and gate edge (50a) and also between diffused region (58) and gate edge (50b).