Inventors:
Chuong R. Tran - San Jose CA
Assignee:
Dainippon Screen Mfg. Co., Ltd.
International Classification:
B05C 1110
Abstract:
A system for eliminating air from liquid-carrying conduits, in particular in a photoresist dispensing system, with features for reducing the possibility of contamination by residual resist in the conduits after the air elimination process has been carried out. Double or multiple tubing, with one or more secondary tubes contained within an outer tube, is used to interconnect the trap tank, the drain and the vacuum chamber. Resist is directed through the double or multiple tubing such that resist is completely evacuated from the vacuum chamber, and from the trap tank, to the drain valve. Further, an arrangement for avoiding the consequences of contamination of the air exhaust valve in the system, if a mist of residual resist has not been removed by the air elimination process, includes a vacuum generator downstream from the air exhaust valve. The vacuum from the vacuum generator is applied as a negative pressure downstream from the valve rather than a positive pressure upstream from the valve, thus reducing the possibility of air or contamination being forced backwards through the system by a blockage of the air exhaust valve.