BRUNO TOLLA
Pilots at Bennett Dr, Naperville, IL
License number
Illinois A5017088
Issued Date
May 2016
Expiration Date
May 2018
Category
Airmen
Type
Authorized Aircraft Instructor
Address
Address
3032 Bennett Dr, Naperville, IL 60564
Professional information
Organic Colloidal Dispersion Of Iron Particles, Method For Preparing Same And Use Thereof As Fuel Additive For Internal Combustion Engines
US Patent:
7459484, Dec 2, 2008
Filed:
Dec 19, 2002
Appl. No.:
10/499559
Inventors:
Gilbert Blanchard - Lagny-le-Sec, FR
Jean-Yves Chane-Ching - Lacroix-Salgarde, FR
Bruno Tolla - Naperville IL, US
Jean-Yves Chane-Ching - Lacroix-Salgarde, FR
Bruno Tolla - Naperville IL, US
Assignee:
Rhodia Electronics and Catalysis - La Rochelle
International Classification:
B01F 3/12, B01F 17/10
US Classification:
516 33, 516198, 516204, 516922
Abstract:
The colloidal dispersion of the invention is characterized in that it comprises an organic phase; particles of an iron compound in its amorphous form; and at least one amphiphilic agent. It is prepared by a process in which either an iron salt in the presence of an iron complexing agent or an iron complex is reacted with a base, maintaining the pH of the reaction medium at a value of at most 8 to obtain a precipitate, the iron complexing agent being selected from hydrosoluble carboxylic acids with a complexing constant K such that the pK is at least 3 and the iron complex being selected from the products of reacting iron salts with said acids; then the precipitate obtained or a suspension containing said precipitate is brought into contact with an organic phase in the presence of an amphiphilic agent to obtain the dispersion in an organic phase. The dispersion of the invention can be used as a combustion additive in liquid fuel or motor fuel.
Cmp Slurry Recycling System And Methods
US Patent:
2012004, Feb 23, 2012
Filed:
Aug 16, 2011
Appl. No.:
13/210875
Inventors:
Nicholas Amoroso - Elgin IL, US
Bruno Tolla - Naperville IL, US
David Boldridge - Oswego IL, US
Bruno Tolla - Naperville IL, US
David Boldridge - Oswego IL, US
International Classification:
C09G 1/02, C09K 13/00, B01D 61/14, B01D 15/04, C09K 3/14, B01D 36/00
US Classification:
51308, 51309, 2101952, 210 85, 252 791
Abstract:
The present invention provides a system and method for recycling an abrasive chemical mechanical polishing (CMP) slurry after polishing substrates therewith. The method comprises circulating the recovered CMP slurry from a blending tank through an ultrafiltration unit and back into the, the ultrafiltration unit removing a predetermined amount of water from recovered slurry to form a slurry concentrate; optionally adjusting the pH of the concentrate to a predetermined target level; and optionally adding selected additive chemical components and/or water to the concentrate in amounts sufficient to form a reconstituted CMP slurry that is suitable for use in a CMP process.
Organosols Stabilized By Amphiphilic Block Polymers
US Patent:
2009007, Mar 19, 2009
Filed:
May 2, 2006
Appl. No.:
11/919633
Inventors:
Mathias Destarac - Paris, FR
Bertrand Pavageau - Villenave D'Ornon, FR
Bruno Tolla - Naperville IL, US
Bertrand Pavageau - Villenave D'Ornon, FR
Bruno Tolla - Naperville IL, US
International Classification:
C08K 3/22, C08L 67/06, C08L 53/00
US Classification:
524403, 524413, 524431, 524437, 524539, 524505
Abstract:
Mineral particle dispersions in an organic hydrophobic medium (organosols) are stabilized by amphiphilic block polymers containing Rgroups for developing interactions with the surface of the particles and at least one hydrophobic block B having an affinity for the organic medium of the dispersion.