BINH T TRAN
Cosmetology at Thistledew Dr, Houston, TX
License number
Texas 1661668
Expiration Date
Mar 12, 2019
Category
Cosmetologist
Address
Address
15730 Thistledew Dr, Houston, TX 77082
Phone
(281) 730-4912
Professional information
Server Administrator At Bechtel
Position:
Server Administrator at Bechtel
Location:
Houston, Texas Area
Industry:
Construction
Work:
Bechtel
since Jul 2006
-
Server Administrator
Senior Engineer At Tl Precision Welding, Inc.
Position:
Senior Engineer at TL Precision Welding, Inc.
Location:
Houston, Texas Area
Industry:
Consumer Services
Work:
TL Precision Welding, Inc.
since Jun 2006
-
Senior Engineer
Education:
Western Michigan University 1998 - 2006
PhD, Organic Chemistry Western Michigan University 1994 - 1996
BS, Biomedical, Chemistry
PhD, Organic Chemistry Western Michigan University 1994 - 1996
BS, Biomedical, Chemistry
Mechanic At Warehouserack.com
Position:
Mechanic at WarehouseRack.com
Location:
Houston, Texas Area
Industry:
Warehousing
Work:
WarehouseRack.com
-
Mechanic
Tubing Intrucement At W-Industries
Position:
tubing intrucement at w-industries
Location:
Houston, Texas Area
Industry:
Computer Networking
Work:
w-industries
-
tubing intrucement
It Support At Valsamis, Inc.
Position:
IT support at Valsamis, Inc.
Location:
Houston, Texas Area
Industry:
Computer Networking
Work:
Valsamis, Inc.
-
IT support
Education:
University of Houston
Binh Tran - Houston, TX
Work:
Cameron
CNC Machinist Tenaris Hydril - Houston, TX
CNC Machinist Smith International - Houston, TX
CNC Machinist PGI International - Houston, TX
CNC Machinist Howmet Casting - Winsted, CT
CNC Machinist
CNC Machinist Tenaris Hydril - Houston, TX
CNC Machinist Smith International - Houston, TX
CNC Machinist PGI International - Houston, TX
CNC Machinist Howmet Casting - Winsted, CT
CNC Machinist
Education:
Torrington High School - Torrington, CT
Diploma
Diploma
Electrical/Electronic Manufacturing Professional
Location:
Houston, Texas Area
Industry:
Electrical/Electronic Manufacturing
Binh Tran - Houston, TX
Work:
Prairie View A&M University
Server Administrator II Bechtel Corporation - Houston, TX
Server Administrator Energy-Solution - Houston, TX
Network Analyst ExxonMobil - Houston, TX
Network Administrator City of Houston - Houston, TX
System Analyst III
Server Administrator II Bechtel Corporation - Houston, TX
Server Administrator Energy-Solution - Houston, TX
Network Analyst ExxonMobil - Houston, TX
Network Administrator City of Houston - Houston, TX
System Analyst III
Education:
University Of Houston, Houston Community College
A.A.S in Information Technology
A.A.S in Information Technology
Rotating Substrate Support And Methods Of Use
US Patent:
2012029, Nov 22, 2012
Filed:
Jul 26, 2012
Appl. No.:
13/559511
Inventors:
Jacob Smith - Santa Clara CA, US
ALEXANDER TAM - Union City CA, US
R. SURYANARAYANAN IYER - Edina MN, US
SEAN SEUTTER - San Jose CA, US
BINH TRAN - Houston TX, US
NIR MERRY - Mountain View CA, US
ADAM BRAILOVE - San Jose CA, US
ROBERT SHYDO, JR. - Pelham NH, US
ROBERT ANDREWS - Kensington NH, US
FRANK ROBERTS - North Reading MA, US
THEODORE SMICK - Essex MA, US
GEOFFREY RYDING - Manchester MA, US
ALEXANDER TAM - Union City CA, US
R. SURYANARAYANAN IYER - Edina MN, US
SEAN SEUTTER - San Jose CA, US
BINH TRAN - Houston TX, US
NIR MERRY - Mountain View CA, US
ADAM BRAILOVE - San Jose CA, US
ROBERT SHYDO, JR. - Pelham NH, US
ROBERT ANDREWS - Kensington NH, US
FRANK ROBERTS - North Reading MA, US
THEODORE SMICK - Essex MA, US
GEOFFREY RYDING - Manchester MA, US
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
C23C 14/50
US Classification:
118725
Abstract:
A method and apparatus for processing a substrate utilizing a rotating substrate support are disclosed herein. In one embodiment, an apparatus for processing a substrate includes a chamber having a substrate support assembly disposed within the chamber. The substrate support assembly includes a substrate support having a support surface and a heater disposed beneath the support surface. A shaft is coupled to the substrate support and a motor is coupled to the shaft through a rotor to provide rotary movement to the substrate support. A seal block is disposed around the rotor and forms a seal therewith. The seal block has at least one seal and at least one channel disposed along the interface between the seal block and the shaft. A port is coupled to each channel for connecting to a pump. A lift mechanism is coupled to the shaft for raising and lowering the substrate support.
Cvd Apparatus For Improved Film Thickness Non-Uniformity And Particle Performance
US Patent:
2010029, Nov 25, 2010
Filed:
Apr 20, 2010
Appl. No.:
12/763522
Inventors:
BINH TRAN - Houston TX, US
ANQING CUI - Palo Alto CA, US
BERNARD L. HWANG - Santa Clara CA, US
SON T. NGUYEN - San Jose CA, US
ANH N. NGUYEN - Milpitas CA, US
SEAN M. SEUTTER - San Jose CA, US
XIANZHI TAO - San Jose CA, US
ANQING CUI - Palo Alto CA, US
BERNARD L. HWANG - Santa Clara CA, US
SON T. NGUYEN - San Jose CA, US
ANH N. NGUYEN - Milpitas CA, US
SEAN M. SEUTTER - San Jose CA, US
XIANZHI TAO - San Jose CA, US
Assignee:
APPLIED MATERIALS, INC. - Santa Clara CA
International Classification:
H01L 21/02, C23C 16/00, C23C 16/513, C23C 16/455
US Classification:
118723 R, 118715, 118722, 257E21002
Abstract:
Embodiments of the invention provide improved apparatus for depositing layers on substrates, such as by chemical vapor deposition (CVD). The inventive apparatus disclosed herein may advantageously facilitate one or more of depositing films having reduced film thickness non-uniformity within a given process chamber, improved particle performance (e.g., reduced particles on films formed in the process chamber), chamber-to-chamber performance matching amongst a plurality of process chambers, and improved process chamber serviceability.