Inventors:
Anthony J. Farino - Albuquerque NM
Assignee:
Sandia Corporation - Albuquerque NM
International Classification:
B08B 304
US Classification:
134 26, 134 2, 134 32, 134 33, 134 34, 134 36, 134 42, 134902, 510176
Abstract:
A method for reconditioning the surface of a semiconductor substrate to remove an unwanted (i. e. defective) layer of photoresist is disclosed. The method adapts a conventional automated spinner which is used to rotate the substrate at high speed while a stream of a first solvent (e. g. acetone) is used to dissolve the photoresist. A stream of a second solvent (e. g. methanol) is then used to clean the substrate at a lower speed, with the substrate being allowed to dry with continued rotation. The method of the present invention can be used within a photolithography track so that the substrates need never leave the track for reconditioning.