ANDREW H. CHANG, MD
Osteopathic Medicine at Main St, Walnut Creek, CA
License number
California A76647
Category
Osteopathic Medicine
Type
Internal Medicine
Address
Address
2
1425 S Main St, Walnut Creek, CA 94596
1800 Harrison St FL 7, Oakland, CA 94612
1800 Harrison St FL 7, Oakland, CA 94612
Phone
(925) 295-4000
(510) 625-6262
(510) 625-6262
Professional information
Andrew Horngtzu Chang, Walnut Creek CA
Specialties:
Internist
Address:
1425 S Main St, Walnut Creek, CA 94596
Education:
University of California Davis, School of Medicine - Doctor of Medicine
Santa Clara Valley Medical Center - Residency - Internal Medicine
Santa Clara Valley Medical Center - Residency - Internal Medicine
Board certifications:
American Board of Internal Medicine Certification in Internal Medicine
Andrew Nathan Chang, Walnut Creek CA - Lawyer
Address:
Esner Chang & Boyer
35 Quail Ct STE 303, Walnut Creek 94596
(925) 937-4477
35 Quail Ct STE 303, Walnut Creek 94596
(925) 937-4477
Licenses:
California - Active 1978
Education:
University of California, Hastings College of The LawGraduated 1978
University of California at Los Angeles School of Law
University of California at Los Angeles School of Law
Specialties:
Appeals - 100%
Dr. Andrew H Chang, Walnut Creek CA - MD (Doctor of Medicine)
Specialties:
Internal Medicine
Age:
51
Address:
Kaiser Walnut Creek Medical Grp
1425 S Main St, Walnut Creek 94596
(925) 295-4000 (Phone)
1425 S Main St, Walnut Creek 94596
(925) 295-4000 (Phone)
Certifications:
Internal Medicine, 2013
Awards:
Healthgrades Honor Roll
Languages:
English
Education:
Medical School
University Of California, Davis, School Of Medicine
Graduated: 2000
Santa Clara Valley Med Center
Graduated: 2001
Graduated: 2003
University Of California, Davis, School Of Medicine
Graduated: 2000
Santa Clara Valley Med Center
Graduated: 2001
Graduated: 2003
Andrew Horng-Tzu Chang, Walnut Creek CA
Specialties:
Internal Medicine
Work:
Walnut Creek Wellness Center
1515 Newell Ave, Walnut Creek, CA 94596
1515 Newell Ave, Walnut Creek, CA 94596
Education:
University of California at Davis (2000)
Systems And Methods Utilizing An Aperture With A Reactive Atom Plasma Torch
US Patent:
7304263, Dec 4, 2007
Filed:
Aug 5, 2004
Appl. No.:
10/911821
Inventors:
Andrew Chang - Oakland CA, US
Jeffrey W. Carr - Livermore CA, US
Jude Kelley - Belmont CA, US
Peter S. Fiske - Oakland CA, US
Jeffrey W. Carr - Livermore CA, US
Jude Kelley - Belmont CA, US
Peter S. Fiske - Oakland CA, US
Assignee:
RAPT Industries, Inc. - Fremont CA
International Classification:
B23K 9/00
US Classification:
21912141, 21912148, 21912159, 15634539, 264 136, 216 38
Abstract:
The footprint of a reactive atom plasma processing tool can be modified using an aperture device. A flow of reactive gas can be injected into the center of an annular plasma. An aperture can be positioned relative to the plasma such that the effective footprint of the plasma can be changed without adjusting the gas flows or swapping out the tool. Once the aperture and tool are in position relative to a workpiece, reactive atom plasma processing can be used to modify the surface of the workpiece, such as to etch, smooth, polish, clean, and/or deposit material onto the workpiece. If necessary, a coolant can be circulated about the aperture. Multiple apertures can also be used to provide a variety of footprint sizes and/or shapes. This description is not intended to be a complete description of, or limit the scope of, the invention. Other features, aspects, and objects of the invention can be obtained from a review of the specification, the figures, and the claims.
Systems And Methods Utilizing An Aperture With A Reactive Atom Plasma Torch
US Patent:
2008003, Feb 14, 2008
Filed:
Oct 19, 2007
Appl. No.:
11/875787
Inventors:
Andrew Chang - Oakland CA, US
Jeffrey Carr - Livermore CA, US
Jude Kelley - Belmont CA, US
Peter Fiske - Oakland CA, US
Jeffrey Carr - Livermore CA, US
Jude Kelley - Belmont CA, US
Peter Fiske - Oakland CA, US
Assignee:
RAPT INDUSTRIES, INC. - Fremont CA
International Classification:
B23K 10/00
US Classification:
219121440
Abstract:
A method for reducing heat applied to a workpiece by a plasma discharge of a reactive plasma torch comprises determining a footprint of the plasma discharge on a surface of the workpiece based on a distance of the reactive atom plasma torch from the surface, determining a maximum heat absorbable by the workpiece, and determining an adjusted footprint of the reactive atom plasma torch on the surface based on the maximum heat absorbable by the workpiece. An aperture of an aperture device is selected based on the adjusted footprint of the reactive atom plasma torch. The aperture device is then positioned so that a portion of the plasma is one or both of deflected and absorbed by the aperture device, thereby reducing the heat absorbed by the workpiece.
Apparatus And Method For Non-Contact Shaping And Smoothing Of Damage-Free Glass Substrates
US Patent:
2005006, Mar 24, 2005
Filed:
Aug 6, 2004
Appl. No.:
10/913808
Inventors:
Jude Kelley - Belmont CA, US
Jeffrey Carr - Livermore CA, US
Peter Fiske - Oakland CA, US
Andrew Chang - Oakland CA, US
Jeffrey Carr - Livermore CA, US
Peter Fiske - Oakland CA, US
Andrew Chang - Oakland CA, US
Assignee:
RAPT Industries, Inc. - Livermore CA
International Classification:
C03C015/02, C23F001/12
US Classification:
216067000, 216059000, 216074000, 065029120, 065102000, 065111000
Abstract:
High-quality glass parts, such as high-end optics, can be generated using a completely damage free process. An intial damage-free forming step, such as sluping, can be used to roughly shape a glass workpiece without imparting any subsurface damage. A reactive atom processing (RAP) process can then be used to rapidly remove any anomalies or imperfections from the surface of the optic without imparting any damage unto the optic. This description is not intended to be a complete description of, or limit the scope of, the invention. Other features, aspects, and objects of the invention can be obtained from a review of the specification, the figures, and the claims.