ALBERTO SANTONI
Pilots at Roberts Is Rd, Orlando, FL
License number
Florida A5262583
Issued Date
Aug 2015
Expiration Date
Aug 2017
Category
Airmen
Type
Authorized Aircraft Instructor
Address
Address
13009 Roberts Island Rd, Orlando, FL 32832
Professional information
Alberto Santoni - Orlando, FL
Work:
TRIQUINT SEMICONDUCTOR
Plant/Facilities Engineer SANTONI INTERNATIONAL BUILDERS, LLC - Orlando, FL
President/ Licensed General Contractor Lucent Technologies - Orlando, FL
Senior Technical Associate Lucent Technologies
Process Engineer/Manufacturing Engineer (MTS Lucent Technologies
Senior Technical Associate Lucent Technologies
Process Analyst FLEXMATE AND SOFTWARE MAGIC, INC - Casselberry, FL
Applications Engineer
Plant/Facilities Engineer SANTONI INTERNATIONAL BUILDERS, LLC - Orlando, FL
President/ Licensed General Contractor Lucent Technologies - Orlando, FL
Senior Technical Associate Lucent Technologies
Process Engineer/Manufacturing Engineer (MTS Lucent Technologies
Senior Technical Associate Lucent Technologies
Process Analyst FLEXMATE AND SOFTWARE MAGIC, INC - Casselberry, FL
Applications Engineer
Education:
University of Central Florida - Orlando, FL
Master's of Science in Industrial Engineering and Management Systems University of Central Florida - Orlando, FL
Bachelor of Science, Electrical Engineering Technology in Electronic Circuit Design and Communication Systems.
Master's of Science in Industrial Engineering and Management Systems University of Central Florida - Orlando, FL
Bachelor of Science, Electrical Engineering Technology in Electronic Circuit Design and Communication Systems.
Skills:
Autocad 2012, Microsoft Office, Microsoft Project.
Overlay Metrology Using Scatterometry Profiling
US Patent:
2003022, Dec 4, 2003
Filed:
May 30, 2002
Appl. No.:
10/158775
Inventors:
Cynthia Lee - Orlando FL, US
Stephen Meisner - Allen TX, US
Thomas Wolf - Orlando FL, US
Alberto Santoni - Orlando FL, US
John McIntosh - Orlando FL, US
Stephen Meisner - Allen TX, US
Thomas Wolf - Orlando FL, US
Alberto Santoni - Orlando FL, US
John McIntosh - Orlando FL, US
International Classification:
G01B011/00
US Classification:
356/401000
Abstract:
A method for nondestructively characterizing alignment overlay between two layers of a semiconductor wafer. An incident beam of radiation is directed upon the wafer surface and the properties of the resulting diffracted beam are determined, in one embodiment as a function of wavelength or incident angle. The spectrally or angularly resolved characteristics of the diffracted beam are related to the alignment of the overlay features. A library of calculated diffraction spectra is established by modeling a full range of expected variations in overlay alignment. The spectra resulting from the inspection of an actual wafer having alignment targets in at least two layers is compared against the library to identify a best fit to characterize the actual alignment. The results of the comparison may be used as an input for upstream and/or downstream process control.